2022
DOI: 10.1016/j.mssp.2021.106189
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Indium tin oxide obtained by high pressure sputtering for emerging selective contacts in photovoltaic cells

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Cited by 7 publications
(2 citation statements)
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“…Table summarizes the performance of the best electrochemically grown Ag NW grid ( w = 99 nm, L = 4 μm, h = 345 nm) and those for other similar Ag nanowire TEs, as well as for 80 nm thick ITO, which is used as industrial standard. ,,, From the table, one can clearly see how the electrochemically grown Ag NW grid largely outperforms all other nanoscale approaches. This result was obtained for the most sparse grid with the largest aspect ratio.…”
Section: Resultsmentioning
confidence: 99%
“…Table summarizes the performance of the best electrochemically grown Ag NW grid ( w = 99 nm, L = 4 μm, h = 345 nm) and those for other similar Ag nanowire TEs, as well as for 80 nm thick ITO, which is used as industrial standard. ,,, From the table, one can clearly see how the electrochemically grown Ag NW grid largely outperforms all other nanoscale approaches. This result was obtained for the most sparse grid with the largest aspect ratio.…”
Section: Resultsmentioning
confidence: 99%
“…They have highlighted that the primary source of these high-energy particles consists of sputtered negative ions (such as O − , , InO − , etc.). These ions are accelerated by the cathode sheath, carrying an energy level closely matching the target voltage, typically in the range of hundreds of electron volts (eV) [13,14]. Furthermore, various efforts have been made to mitigate sputtering damages.…”
Section: Introductionmentioning
confidence: 99%