2017
DOI: 10.1016/j.mssp.2016.11.036
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Increased doping depth of Al in wet-chemical laser doping of 4H-SiC by expanding laser pulse

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Cited by 7 publications
(4 citation statements)
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“…For ELA, utilizing an optical pulse stretcher (OPS) is also an important factor since performing ELA without OPS yielded µ improvement but the resulting µ was insufficient (<1 cm 2 V −1 s −1 ). The OPS extends the excimer laser pulse duration by stretching the temporal profile to prevent ablation and generate longer and more efficient laser-induced heating [24]. Employing a single ELA shot is also vital to not only reduce process complexity and process time but also to minimize laser-induced damage and easily control the total laser energy imparted to the film.…”
mentioning
confidence: 99%
“…For ELA, utilizing an optical pulse stretcher (OPS) is also an important factor since performing ELA without OPS yielded µ improvement but the resulting µ was insufficient (<1 cm 2 V −1 s −1 ). The OPS extends the excimer laser pulse duration by stretching the temporal profile to prevent ablation and generate longer and more efficient laser-induced heating [24]. Employing a single ELA shot is also vital to not only reduce process complexity and process time but also to minimize laser-induced damage and easily control the total laser energy imparted to the film.…”
mentioning
confidence: 99%
“…As a low-temperature doping technique, a method of applying laser irradiation to the SiC substrate in dopantcontaining gas or solution has been studied. [9][10][11][12][13][14] Recently, we have shown that it is able to form a highly doped layer by laser irradiation to an Al thin-film deposited on the 4H-SiC surface as a diffusion source. 15) In this paper, we show that very low resistance contacts can be formed by using this doping method which does not require high-temperature annealing.…”
mentioning
confidence: 99%
“…The original laser pulse was expanded by using an optical pulse stretcher (OPS) to suppress the laser ablation of the surface and to increase the heat retention time by laser irradiation. 10) Ar gas blowing to the sample surface was employed to keep the surface unreacted during irradiation. After laser doping, the Al thin-film and the surface compounds were etched with phosphoric acid, CF 4 plasma, and O 2 plasma, respectively.…”
mentioning
confidence: 99%
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