2012
DOI: 10.7567/jjap.51.080201
|View full text |Cite
|
Sign up to set email alerts
|

InAs Quantum Dot Growth on a Thin GaNP Buffer Layer on GaP by Metalorganic Chemical Vapor Deposition

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
1
0

Year Published

2014
2014
2014
2014

Publication Types

Select...
1

Relationship

0
1

Authors

Journals

citations
Cited by 1 publication
(1 citation statement)
references
References 13 publications
0
1
0
Order By: Relevance
“…2,3 Being an indirect semiconductor, GaP cannot serve as active medium for efficient photonic devices. Consequently, several studies of InGaAs [4][5][6][7][8] and InGaAsN 9 QDs on GaP have been published during the last years, including an InGaAs/GaP QD light emitting diode on Si substrate. 10 The extreme lattice mismatch of 11.2% between InAs and GaP on the one hand represents a challenge for the growth of dislocation-free QD structures.…”
mentioning
confidence: 99%
“…2,3 Being an indirect semiconductor, GaP cannot serve as active medium for efficient photonic devices. Consequently, several studies of InGaAs [4][5][6][7][8] and InGaAsN 9 QDs on GaP have been published during the last years, including an InGaAs/GaP QD light emitting diode on Si substrate. 10 The extreme lattice mismatch of 11.2% between InAs and GaP on the one hand represents a challenge for the growth of dislocation-free QD structures.…”
mentioning
confidence: 99%