2011
DOI: 10.1016/j.infrared.2011.07.009
|View full text |Cite
|
Sign up to set email alerts
|

InAs/GaSb superlattices grown by LP-MOCVD for ∼10μm wavelength infrared range

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
1
0
1

Year Published

2019
2019
2023
2023

Publication Types

Select...
3

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(2 citation statements)
references
References 19 publications
0
1
0
1
Order By: Relevance
“…Zhang's group [158] suggested that introducing a ∼2ML-thick InAs 0.8 Sb 0.2 layer at the GaSb → InAs interfaces of the T2SLs would significantly improve the morphology and structural properties. Chang et al also [159] demonstrated the validity of an InAsSb interface layer, by which ∼10 µm LWIR T2SLs were obtained, and confirmed effective flexibility in a growth temperature range of 500 • C-520 • C utilizing LP-MOCVD. Nedelcu's group [154] proposed a complex scheme with a smooth InAs → InAsSb → InGaSb → GaSb → InGaSb → InAsSb → InAs structure achieving optimal morphology and low strain.…”
Section: Growth Of Inas/gasb T2slsmentioning
confidence: 81%
“…Zhang's group [158] suggested that introducing a ∼2ML-thick InAs 0.8 Sb 0.2 layer at the GaSb → InAs interfaces of the T2SLs would significantly improve the morphology and structural properties. Chang et al also [159] demonstrated the validity of an InAsSb interface layer, by which ∼10 µm LWIR T2SLs were obtained, and confirmed effective flexibility in a growth temperature range of 500 • C-520 • C utilizing LP-MOCVD. Nedelcu's group [154] proposed a complex scheme with a smooth InAs → InAsSb → InGaSb → GaSb → InGaSb → InAsSb → InAs structure achieving optimal morphology and low strain.…”
Section: Growth Of Inas/gasb T2slsmentioning
confidence: 81%
“…Промышленное изготовление полупроводниковых приборов, в том числе для приложений в области опто-и фотоэлектроники, традиционно производится методом газофазной эпитаксии из металлоорганических соединений (МОСГФЭ). С учетом все возрастающих потребностей в приборах оптоэлектроники СВ ИК диапазона (см., например, обзоры [11,12]), отработка и совершенствование технологии МОСГФЭ для структур на основе InAs/GaSb становится весьма актуальной, однако количество исследований в этой области пока ограничено [13][14][15][16][17][18][19][20]. Кроме того, до самого последнего времени исследования роста СР в системе InAs/GaSb методом МОСГФЭ проводились с выращиванием относительно толстых (толщиной более 5 nm) слоев [14][15][16][17][18][19][20].…”
Section: Introductionunclassified