2017
DOI: 10.1016/j.jcrysgro.2016.11.079
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InAs/GaSb/AlSb composite quantum well structure preparation with help of reflectance anisotropy spectroscopy

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Cited by 9 publications
(4 citation statements)
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“…On this sample, we layer transfer graphene on half of the GaSb (001) substrate using a wet transfer procedure similar to the one that has previously been used for remote epitaxy of GaAs, including an HCl etch to remove native oxides from the substrate 1 , 13 (Methods). HCl 23 25 and HCl+H 2 O 2 solutions 26 , 27 are also commonly used to etch native oxides from GaSb. The other half of the sample has an exposed GaSb surface for direct epitaxy.…”
Section: Resultsmentioning
confidence: 99%
“…On this sample, we layer transfer graphene on half of the GaSb (001) substrate using a wet transfer procedure similar to the one that has previously been used for remote epitaxy of GaAs, including an HCl etch to remove native oxides from the substrate 1 , 13 (Methods). HCl 23 25 and HCl+H 2 O 2 solutions 26 , 27 are also commonly used to etch native oxides from GaSb. The other half of the sample has an exposed GaSb surface for direct epitaxy.…”
Section: Resultsmentioning
confidence: 99%
“…In the broken gap heterojunctions 𝐸 𝑐 of InSe is lower than 𝐸 𝑣 of Sb 2 Te 3 forcing an overlap between the conduction band of InSe with valence band of Sb 2 Te 3 . Such type of heterojunction devices were nominated as promising devices for spintronic and nanoelectronic applications [13]. The band bending, vacuum level lowering and thermal equilibrium of Fermi levels are shown in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Обе ямы в ККЯ предварительно не легировались. Процесс выращивания контролировался in situ с помо-щью установки спектроскопии анизотропного отражения (RAS) [25]. Ширина ям выбиралась из условия по-лучения инвертированной (полуметаллической) зонной структуры ККЯ.…”
Section: образцы и методика измеренийunclassified