2019
DOI: 10.1021/acs.nanolett.8b05171
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In Situ Transmission Electron Microscopy Analysis of Aluminum–Germanium Nanowire Solid-State Reaction

Abstract: To fully exploit the potential of semiconducting nanowires for devices, high quality electrical contacts are of paramount importance. This work presents a detailed in situ transmission electron microscopy (TEM) study of a very promising type of NW contact where aluminum metal enters the germanium semiconducting nanowire to form an extremely abrupt and clean axial metal–semiconductor interface. We study this solid-state reaction between the aluminum contact and germanium nanowire in situ in the TEM using two di… Show more

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Cited by 45 publications
(95 citation statements)
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“…This type of interface would fit our observation of a hard gap which requires a defect-free highly homogeneous heterointerface [13], combined with the tunneling behavior achieved close to depletion. We therefore conclude that the diffusion-induced formation of X1 is essential for the hard induced gap [35,36]. CONCLUSION We have shown that Ge-Si nanowire devices with Al contacts contain additional superconductors after annealing, caused by diffusion of Al into the nanowire channel.…”
Section: Hard Superconducting Gapmentioning
confidence: 70%
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“…This type of interface would fit our observation of a hard gap which requires a defect-free highly homogeneous heterointerface [13], combined with the tunneling behavior achieved close to depletion. We therefore conclude that the diffusion-induced formation of X1 is essential for the hard induced gap [35,36]. CONCLUSION We have shown that Ge-Si nanowire devices with Al contacts contain additional superconductors after annealing, caused by diffusion of Al into the nanowire channel.…”
Section: Hard Superconducting Gapmentioning
confidence: 70%
“…As is the convention in EDX analysis, L and K denote the orbital to which an electron decays in a picture where K, L, and M are the outer atomic orbitals, while α and β indicate whether it decays from the first or second higher orbital. The Al Kα signal shows the opposite behavior, implying that Ge has been replaced by Al in Area 2 [35,36]. The counts for elements O, C and Si remain equal in both areas (see also Supplementary Information Fig.…”
Section: Al-ge Inter-diffusionmentioning
confidence: 97%
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“…This image has been obtained on a probe corrected Titan Themis working at 200 kV. For STEM observations, devices were fabricated on electron transparent Si 3 N 4 membranes, as described in ref [18].…”
mentioning
confidence: 99%
“…To overcome these limitations, material combinations with no intermetallic phase formation, such as the Al-Ge system, enabling true metal-semiconductor heterostructures with abrupt metal-semiconductor interfaces received a considerable amount of attention. 12,13,14,15,16,17 Within this paper, we apply quasi 1D…”
mentioning
confidence: 99%