2011
DOI: 10.1007/s11664-011-1785-8
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In Situ Synchrotron Characterization of Melting, Dissolution, and Resolidification in Lead-Free Solders

Abstract: Melting and solidification of SAC 305 lead-free solder joints in a wafer-level chip-scale package were examined in situ with synchrotron x-ray diffraction. The chips with balls attached (but not assembled to a circuit board) were reflowed one to three times using a temperature and time history similar to an industrial reflow process. Diffraction patterns from the same joint were collected every 0.5 s during the melting and solidification process. The solidification of the Sn phase in the solder joint occurred … Show more

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Cited by 12 publications
(4 citation statements)
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“…25 In situ measurements of melting and solidification were also investigated using synchrotron beam line 6ID-D using a wafer-level chip-scale package (WLCSP) with 250-lm solder balls in a 0.5-mmpitch 10 9 10 array directly attached to a 6 mm 9 7 mm silicon die. 27 The beam size included the whole corner ball, the underbump metallurgy, and a small part of the silicon. Multiple samples were reflowed using a history similar to industrial practice, with as many as four reflow events.…”
Section: Methodsmentioning
confidence: 99%
“…25 In situ measurements of melting and solidification were also investigated using synchrotron beam line 6ID-D using a wafer-level chip-scale package (WLCSP) with 250-lm solder balls in a 0.5-mmpitch 10 9 10 array directly attached to a 6 mm 9 7 mm silicon die. 27 The beam size included the whole corner ball, the underbump metallurgy, and a small part of the silicon. Multiple samples were reflowed using a history similar to industrial practice, with as many as four reflow events.…”
Section: Methodsmentioning
confidence: 99%
“…Around the world synchrotron radiation facilities have designated tomography and diffraction beamlines that are used for failure analysis of microelectronic packages. Some examples of this are imaging void formation caused by electromigration [1][2][3] , evaluating mechanisms for tin whisker growth 4,5 , in situ observations of undercooling and anisotropic thermal expansion of tin and intermetallic compounds (IMCs) 6,7 , in situ observation of solidification and IMC formation [8][9][10] , anisotropic mechanical behavior and recrystallization of tin and lead free solders 10 , voids in flip chip bumps, and in situ observations of Ag-nanoink sintering 11 . All of these studies have further advanced the understanding and development of components in the microelectronic industry.…”
Section: Introductionmentioning
confidence: 99%
“…Around the world synchrotron radiation facilities have designated tomography and diffraction beamlines that are used for failure analysis of microelectronic packages. Some examples of this are imaging void formation caused by electromigration [1][2][3] , evaluating mechanisms for tin whisker growth 4,5 , in situ observations of undercooling and anisotropic thermal expansion of tin and intermetallic compounds (IMCs) 6,7 , in situ observation of solidification and IMC formation [8][9][10] , anisotropic mechanical behavior and recrystallization of tin and lead free solders 10 , voids in flip chip bumps, and in situ observations of Ag-nanoink sintering 11 . All of these studies have further advanced the understanding and development of components in the microelectronic industry.…”
Section: Introductionmentioning
confidence: 99%