In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition

Structural and Optical Properties of PECVD TiO2-SiO2Mixed Oxide Films for Optical Applications

“…The SEM cross‐sections in Figure show that the pure TiO 2 film deposited at R Si = 0 exhibits a columnar structure which has been described in the previous papers . Such a TiO 2 film was shown to be composed of a dense bottom layer (at the Si interface), a disordered gradient upper layer and a rough layer at the top surface.…”

“…In this work, the spectroscopic ellipsometry measurements have been conducted on the TiO 2 –SiO 2 mixed films (for 0.22 ≤ R Si ≤ 0.74), and their optical properties have been extracted by modeling the measured data. The SE study on pure TiO 2 with the above morphology has been investigated in the previous publications . In the SE modeling process, both structural and optical models are considered, the structural model represents a possible film structure with relevant film layers, and the optical model represents the optical constants of each film layer used in the optimized structural model.…”

“…TiO 2 SiO 2 mixed oxide films (200–300 nm thick) were deposited on silicon (100) substrates in the diffusion plasma of a low pressure (∼ 3 mTorr) high density radiofrequency (rf, 13.56 MHz) inductively coupled plasma source (ICP) which has been detailed in the earlier publications . It consist of two parts: the plasma source and the diffusion chamber where a substrate is positioned.…”

Nanocrystalline TiO2 thin film prepared by low-temperature plasma-enhanced chemical vapor deposition for photocatalytic applications

“…Obviously, such a substrate temperature is not suitable with polymeric substrates whose thermal stability is lower than 250°C. More recently, the group of Goullet applied a bias voltage of −10 or −50 V on the electrode holding the silicon substrate to produce anatase with T s b 150°C, TTIP + O 2 pressure equal to 400 Pa and power fixed at 400 W [27]. Another group (Srivatsa et al) could obtain anatase at an even lower temperature (T s = 40°C) by applying a bias voltage of − 150 V (with TTIP + Ar + O 2 pressure in the range 30-100 Pa and power equal to 60 W) [28]; nevertheless, various three-dimensional nanostructures instead of a continuous thin film were obtained at such high bias voltage.…”

Study of dye sensitized solar cell application of TiO2 nanostructured films synthesis by hydrothermal process

“…Several processes have been developed to form TiO 2 photo-anode, such as doctor blade [1,2] , screen printing [3,4] , sputtering [5][6][7] , sol-gel [8,9] , hydrothermal [10][11][12] , spin-coating [13,14] , AP plasma jet [15][16][17] , spray pyrolysis [18,19] and so on. Hydrothermal process possesses low-cost, large-area and easyoperation priorities, was used to synthesize TiO 2 films in many research teams.…”