2008
DOI: 10.1002/pssa.200777798
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In‐situ spectroscopic ellipsometry: optimization of monitoring and closed‐loop‐control procedures

Abstract: We discuss optimized extraction of information contained in a series of complex reflectance ratios in a series of consecutive, in‐situ SE measurements during the growth of thin films. We present a general computational scheme and discuss guidelines for the optimum data treatment. As an example, we analyze several hundreds of spectra recorded during the growth of diamond‐like carbon on TiCN/steel substrate. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

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Cited by 2 publications
(3 citation statements)
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“…Consequently, the optical absorption is located mainly in the ultraviolet; it shifts toward visible range during the later stages of deposition, due to the better tetrahedral bonding of the growing material. This behavior is indeed observed via a pronounced redshift of the spectral weight of the retrieved optical functions (Humlíček 2008 ). Even if only the temporal evolution of the film thickness d was important, it would not be possible to retrieve it from the data without an adequate knowledge of the optical constants.…”
Section: Ellipsometry Capabilities For Measurements At the Nanoscalementioning
confidence: 87%
See 1 more Smart Citation
“…Consequently, the optical absorption is located mainly in the ultraviolet; it shifts toward visible range during the later stages of deposition, due to the better tetrahedral bonding of the growing material. This behavior is indeed observed via a pronounced redshift of the spectral weight of the retrieved optical functions (Humlíček 2008 ). Even if only the temporal evolution of the film thickness d was important, it would not be possible to retrieve it from the data without an adequate knowledge of the optical constants.…”
Section: Ellipsometry Capabilities For Measurements At the Nanoscalementioning
confidence: 87%
“…Consequently, the optical absorption is located mainly in the ultraviolet; it shifts toward visible range during the later stages of deposition, due to the better tetrahedral bonding of the growing material. This behavior is indeed observed via a pronounced redshift of the spectral weight of the retrieved optical functions (Humlíček 2008 ).…”
Section: Ellipsometry Capabilities For Measurements At the Nanoscalementioning
confidence: 87%
“…Zapien et al 28 and the demonstration of SE in an industrial environment, integrating it into a vertical furnace by W. Lehnert et al 18 to follow layer growth during batch processing ( Figure 2 ). 29 Integration of SE in a chemical vapor deposition tool has been demonstrated by C. Eitzinger et al 30 J. Humlicek 31 proposed a general scheme of analyzing the film growth in this tool using a series of in situ SE spectra in a closed-loop system.…”
Section: Instrumentationmentioning
confidence: 99%