2012
DOI: 10.1143/jjap.51.05ea02
|View full text |Cite
|
Sign up to set email alerts
|

In-situ Spectroscopic Ellipsometry of the Cu Deposition Process from Supercritical Fluids: Evidence of an Abnormal Surface Layer Formation

Abstract: In this paper, we report in-situ spectroscopic ellipsometry of Cu deposition from supercritical carbon dioxide fluids. The motivations of this work were 1) to perform a detailed observation of Cu growth with precision optical metrology, 2) to study substrate dependence on Cu growth, particularly for Ru and TiN substrates in the present case, and 3) to demonstrate the possibility and usefulness of ellipsometry for diagnosing supercritical fluid processing. The Cu deposition was carried out through hydrogen redu… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
4
0

Year Published

2013
2013
2023
2023

Publication Types

Select...
5

Relationship

2
3

Authors

Journals

citations
Cited by 5 publications
(4 citation statements)
references
References 50 publications
0
4
0
Order By: Relevance
“…In the future, we plan to apply this IE to the in-situ measurement and study of the optical properties and/or thickness distribution of a metal film while depositing on a substrates in a supercritical fluid. 33) Unlike other existing thin film deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD) whose mechanisms are known clearly, the deposition process in the supercritical fluid is not understood completely yet; therefore, it must to be investigated in more detail by using such techniques as fast imaging ellipsometry. The IE developed at our laboratory is expected to provide both temporal and spatial instrumentations and much information to further clarify the mechanism of this deposition process.…”
Section: Discussionmentioning
confidence: 99%
“…In the future, we plan to apply this IE to the in-situ measurement and study of the optical properties and/or thickness distribution of a metal film while depositing on a substrates in a supercritical fluid. 33) Unlike other existing thin film deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD) whose mechanisms are known clearly, the deposition process in the supercritical fluid is not understood completely yet; therefore, it must to be investigated in more detail by using such techniques as fast imaging ellipsometry. The IE developed at our laboratory is expected to provide both temporal and spatial instrumentations and much information to further clarify the mechanism of this deposition process.…”
Section: Discussionmentioning
confidence: 99%
“…For high refractive index film applications of PI-nanoparticle nanocomposites, most research has focused on TiO 2 nanoparticles because of their high refractive index [21][22][23]. However, cuprous oxide is another material with a high refractive index of 2.93 at a wavelength of 633 nm [25].…”
Section: Introductionmentioning
confidence: 99%
“…During measurement, samples are usually kept inside a chamber and surrounded with particular environmental conditions, such as a vacuum [2], high pressure and high temperature [3], and liquid [1]. The materials of the entrance and exit optical windows attached to the chamber are selected to endure these environments as well as exhibit very small intrinsic birefringence.…”
mentioning
confidence: 99%
“…Approaches with large window effect have been reported [3,9]. The correction method mentioned in [3] needed measurement of windows' birefringence under a given condition in advance by changing the incident polarization state with a rotating quarterwave plate installed before the entrance window. In this measurement, authors performed corrections, assuming that the stress-induced birefringences of both windows were the same.…”
mentioning
confidence: 99%