2013
DOI: 10.1021/jp312309g
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In Situ Reaction Mechanism Studies on Lithium Hexadimethyldisilazide and Ozone Atomic Layer Deposition Process for Lithium Silicate

Abstract: Reaction mechanisms in the LiN[Si(CH3)3]2–O3 atomic layer deposition (ALD) process for lithium silicate were investigated in situ with a quartz crystal microbalance (QCM) and a quadrupole mass spectrometer (QMS) at several temperatures. In addition, ex situ Fourier transform infrared (FT-IR) measurements were carried out to identify the bonds present in the films. QMS indicates typical combustion byproducts such as CO2 (m/z = 44), CO (m/z = 28), H2O (m/z = 18) and NO (m/z = 30) during the ozone pulse. Signals … Show more

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Cited by 22 publications
(35 citation statements)
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“…Yoann Tomczak et al . studied lithium hexadimethyldisilazide and ozone ALD of lithium silicate31. A similar case showing the molecular or stoichiometric adsorption of LiHDMS followed its complete combustion.…”
Section: Resultsmentioning
confidence: 99%
“…Yoann Tomczak et al . studied lithium hexadimethyldisilazide and ozone ALD of lithium silicate31. A similar case showing the molecular or stoichiometric adsorption of LiHDMS followed its complete combustion.…”
Section: Resultsmentioning
confidence: 99%
“…The LiHMDS precursor may be used as a single source precursor for deposition of lithium silicates such as Li 2 SiO 3 by reacting with ozone in a sequential manner . The ozone will also oxidize the ligands resulting in a film containing both lithium and silicon.…”
Section: Li‐materials By Aldmentioning
confidence: 99%
“…The stoichiometry of the deposited film changed somewhat with temperature providing a decreasing Li content with increasing deposition temperature. The growth has been investigated by in situ techniques such as QCM and MS at different temperatures . The investigation indicates a somewhat complex reaction path which does not involve direct ligand exchange between hydroxyl and LiHMDS.…”
Section: Li‐materials By Aldmentioning
confidence: 99%
“…The process exhibited good ALD behaviour at 250 • C, with saturation of both precursors seen and the film thickness increased linearly with the number of cycles. However, no ALD window was present and instead the growth rate increased from approximately 0.3 Å/cycle at 150 • C to 1.7 Å/cycle at 400 • C. This increase was explained with subsequent reaction mechanism studies [111]. The HMDS-ligand of the metal precursor reacts with surface hydroxyl groups, decomposing to different side products.…”
Section: Solid Electrolytesmentioning
confidence: 98%
“…Lithium silicates can have reasonably high lithium-ion conductivities, especially in the amorphous state [125][126][127]. The silylamide precursor LiHMDS (lithium hexamethyldisilazide) provides a convenient route to lithium silicate deposition when combined with ozone [110,111]. The process exhibited good ALD behaviour at 250 • C, with saturation of both precursors seen and the film thickness increased linearly with the number of cycles.…”
Section: Solid Electrolytesmentioning
confidence: 99%