2000
DOI: 10.1016/s0921-5107(99)00243-3
|View full text |Cite
|
Sign up to set email alerts
|

In situ photoluminescence studies of photochemically grown porous silicon

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
15
0

Year Published

2001
2001
2010
2010

Publication Types

Select...
7

Relationship

2
5

Authors

Journals

citations
Cited by 13 publications
(16 citation statements)
references
References 19 publications
1
15
0
Order By: Relevance
“…Kolasinski et al 252 also observed the shift of PL maximum in the blue range for PSi layers, grown photochemically by irradiation with a 15 mW HeNe laser. However, this shift was smaller and observed in the range from 570 to 530 nm.…”
Section: Pl Characterizationmentioning
confidence: 87%
See 3 more Smart Citations
“…Kolasinski et al 252 also observed the shift of PL maximum in the blue range for PSi layers, grown photochemically by irradiation with a 15 mW HeNe laser. However, this shift was smaller and observed in the range from 570 to 530 nm.…”
Section: Pl Characterizationmentioning
confidence: 87%
“…At that the profile of etching layer corresponds to a Gaussian intensity profile of the laser beam, 252 Figure 21 displays a typical film grown after exposure to a HeNe laser at normal incidence.…”
Section: Laser-induced Etching (Lie)mentioning
confidence: 99%
See 2 more Smart Citations
“…Although it has been done in situ studies of PS on n-type silicon substrates, 8,9 these studies did not reveal the intricacies of the morphology variations and their effect on the thermal and electrical properties of the composite system silicon/porous silicon ͑Si/PSi͒. In addition, Lehmann et al 10 reported the morphology of PS samples for different n-type silicon substrates with doping densities between 6 ϫ 10 16 and 2 ϫ 10 19 cm −3 range; however, PS samples on n-type silicon substrates with low doping densities and low porosities have not been extensively studied to date.…”
Section: Introductionmentioning
confidence: 99%