2016
DOI: 10.1016/j.scriptamat.2016.04.007
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In situ observations of Berkovich indentation induced phase transitions in crystalline silicon films

Abstract: The pressure induced phase transitions of crystalline Si films were studied in situ under a Berkovich probe using a Raman spectroscopy-enhanced instrumented indentation technique. The observations suggested strain and time as important parameters in the nucleation and growth of high-pressure phases and, in contrast to earlier reports, indicate that pressure release is not a precondition for transformation to high pressure phases.

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Cited by 17 publications
(5 citation statements)
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“…However, measuring the local properties of metal-nitrides is a daunting task as the inert nature of the nitrogen molecules and the undesirable formation of oxides can lead to nanoscopic inhomogeneities in mechanical properties [ [33] , [34] , [35] ]. The nanoindentation technique can be a promising method to investigate the nanomechanical properties [ 36 ]. The advantage of nanoindentation compared to the tensile test is that the elastic modulus, hardness and flow stresses can be evaluated without the standard specimen fabrication.…”
Section: Introductionmentioning
confidence: 99%
“…However, measuring the local properties of metal-nitrides is a daunting task as the inert nature of the nitrogen molecules and the undesirable formation of oxides can lead to nanoscopic inhomogeneities in mechanical properties [ [33] , [34] , [35] ]. The nanoindentation technique can be a promising method to investigate the nanomechanical properties [ 36 ]. The advantage of nanoindentation compared to the tensile test is that the elastic modulus, hardness and flow stresses can be evaluated without the standard specimen fabrication.…”
Section: Introductionmentioning
confidence: 99%
“…A method of realizing this task combines nanoindentation testing with micro-Raman spectroscopy. This approach has been successfully used on many occasions, e.g., to identify a sequence of the indentation-induced phase transformations of Si [ 2 , 3 , 4 ] or to determine stress in silicon films on a sapphire substrate [ 5 ].…”
Section: Introductionmentioning
confidence: 99%
“…The nanoindentation technique can be a promising method to investigate the nanomechanical properties. 29 During an indentation test, the applied force and the indentation depth is continuous monitored and the elastic modulus and the hardness can be measured. In this work, the titanium nitride (TiN) thin films grown by CVA deposition have been investigated using the nanoindentation to understand the nanomechanical properties of titanium nitride (TiN).…”
Section: Introductionmentioning
confidence: 99%