Abstract:The 1 57nm molecular fluorine laser is regarded as the next generation light source for semiconductor exposure technology in the vacuum ultraviolet (VUV) region. Research for high performance F2 laser optical materials is therefore indispensable. In this paper, we describe methods and results of evaluating optical materials used in the 157nm region. In order to evaluate F2 laser optical materials, we have developed an in-situ system, which measures the real-time transmittance at 157nm during laser irradiation … Show more
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