2020
DOI: 10.1557/jmr.2020.42
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In situ measurement of bulk modulus and yield response of glassy thin films via confined layer compression

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Cited by 10 publications
(37 citation statements)
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“…where G is the elastic shear modulus [17]. At yield, shear stress is capped on the Von Mises yield surface ๐‘„ = ๐‘Œ 0 (dotted black line), allowing only the hydrostatic stress to increase with further loading.…”
Section: Resultsmentioning
confidence: 99%
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“…where G is the elastic shear modulus [17]. At yield, shear stress is capped on the Von Mises yield surface ๐‘„ = ๐‘Œ 0 (dotted black line), allowing only the hydrostatic stress to increase with further loading.…”
Section: Resultsmentioning
confidence: 99%
“…At a stress of ๐œŽ ๐‘ง๐‘ง = ๐‘Œ ๐‘“๐‘™๐‘œ๐‘ค = 0.65 GPa, the confining material yields leading to extrusional flow and gross deviation from the CC state. This confinement failure value has been shown to depend on the geometric and material parameters of the test [17]. Until Yflow, the deformation is highly one dimensional as demonstrated in Fig1d &1e, which show stressstrain curves and AFM residual topography maps for three separate indents of a h0 = 190 nm aPS film.…”
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confidence: 90%
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“…The use of a cylindrical flat punch with a flat film-like sample has a advantages over other forms of indentation testing at small scales where direct means to characterize the contact geometry are difficult or impossible to realize due to adhesive forces and pile-up or sink-in effects 37 . While in principle suffering a stress singularity at the contact edge, in practice the film geometry and mild punch edge rounding 38 mitigate this, leading to a nearly uniform stress distribution across the contact 39 .…”
Section: Introductionmentioning
confidence: 99%