2013
DOI: 10.1016/j.apcata.2013.06.052
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In situ IR study for elucidating reaction mechanism of toluene steam reforming over Ni/La0.7Sr0.3AlO3−δ catalyst

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Cited by 42 publications
(30 citation statements)
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“…Peaks for methylcyclohexane were observed at 1564 cm -1 and 1347 cm -1 , similar to the case of n-heptane. However, peaks for toluene 24) were observed at 1594, 1546, and 1401 cm -1 , in contrast to the other catalysts. These differences in the spectra indicate different conditions for the reaction intermediate and variations in the apparent activation energies, as described in section 3.…”
Section: Apparent Activation Energy and Latticementioning
confidence: 62%
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“…Peaks for methylcyclohexane were observed at 1564 cm -1 and 1347 cm -1 , similar to the case of n-heptane. However, peaks for toluene 24) were observed at 1594, 1546, and 1401 cm -1 , in contrast to the other catalysts. These differences in the spectra indicate different conditions for the reaction intermediate and variations in the apparent activation energies, as described in section 3.…”
Section: Apparent Activation Energy and Latticementioning
confidence: 62%
“…The desorption peaks on Sr/LAO (i.e. Sr 2 was not incorporated but supported on LAO) appeared at 1509 cm -1 and 1393 cm -1 , which were different to the peaks for toluene on LAO 24) . Therefore, the peaks observed for Sr/LAO adsorption are attributable to the adsorption of toluene on Sr 2 sites.…”
Section: Adsorption Sites On Lsao Supportmentioning
confidence: 96%
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“…However, due to the complexity of tar composition, different model molecules representatives of tar have been used in the studies such as benzene, toluene, naphthalene and methylnaphthalene. Nickel-based catalysts have been extensively investigated for the steam reforming (SR) of toluene due to the high activity of Ni for C-C bond breaking and its low cost [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17]. However, nickel catalysts undergo significant deactivation during steam reforming of toluene, mainly attributed to carbon deposition.…”
Section: Introductionmentioning
confidence: 99%