2012
DOI: 10.1016/j.jcrysgro.2012.03.011
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In situ formation of indium catalysts to synthesize crystalline silicon nanowires on flexible stainless steel substrates by PECVD

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Cited by 19 publications
(5 citation statements)
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“…However, the requirement of a bulk wafer prevents the realization of cost-effective devices. Some groups therefore choose to use bottom-up techniques and produce nanowires using catalytic processes such as chemical vapor deposition (CVD) [10-12], allowing the growth of nanowires on noncrystalline substrates [13,14]. However, the production of high-density arrays of aligned nanowires is challenging with this technique because it requires a control of the density and localization of the metallic catalyst seeds.…”
Section: Introductionmentioning
confidence: 99%
“…However, the requirement of a bulk wafer prevents the realization of cost-effective devices. Some groups therefore choose to use bottom-up techniques and produce nanowires using catalytic processes such as chemical vapor deposition (CVD) [10-12], allowing the growth of nanowires on noncrystalline substrates [13,14]. However, the production of high-density arrays of aligned nanowires is challenging with this technique because it requires a control of the density and localization of the metallic catalyst seeds.…”
Section: Introductionmentioning
confidence: 99%
“…For the NWs growth, the indium nanoparticles were served as metal catalysts. 22 The exible stainless steel (SS) was cleaned sequentially in the baths of acetone and deionized water with ultrasonic agitation. The thickness of the stainless steel is about 80 mm and its grade is 304 L. The cleaned stainless steel was sputtered thin Indium Tin Oxide (ITO) by radio frequency magnetron and then transferred into the PECVD chamber.…”
Section: Methodsmentioning
confidence: 99%
“…The indium nanoparticles as metal catalysts were fabricated by hydrogen plasma treatment on the indium tin oxide (ITO)-coated substrates [ 17 ], and the n-type SiNW growth is performed under plasma-enhanced chemical vapor deposition (PECVD) using SiH 4 + PH 3 as the precursor gas and H 2 as the carrier gas [ 18 ]. The flexible stainless steel substrates were cleaned sequentially in baths of acetone, ethanol, and deionized water with ultrasonic agitation for 10 min.…”
Section: Methodsmentioning
confidence: 99%