1995
DOI: 10.1051/mmm:1995115
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In Situ EELS and TEM Observation of Boron Carbide (B4C) During Hydrogen- and Helium-Ion Bombardments

Abstract: Abstract. 2014 Increasing attention has been paid recently to boron carbide (B4C) from a viewpoint of plasma-facing materials in a fusion device. This paper reports structural change of B4C observed in situ by EELS and TEM during hydrogen-and helium-ion bombardments at room temperature. The B4C became amorphous by the ion bombardments. This amorphization process was presented as a function of the shift of plasmon-loss peak energy and the change of core-loss profiles in addition to electron diffraction pattern… Show more

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Cited by 12 publications
(4 citation statements)
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“…The energy-loss near-edge structure (ELNES) of the B K edge illustrates transitions from 1s to unoccupied π* states (sharp peak A) and σ* states (peak B) while peak C can be an effect of plasmon contributions. 42,43 The onset of the B K edge is roughly identical for all defects, starting from 186.8 eV. A minute splitting of peak A was noticed at the faceted grain boundary structure.…”
Section: Resultsmentioning
confidence: 82%
See 1 more Smart Citation
“…The energy-loss near-edge structure (ELNES) of the B K edge illustrates transitions from 1s to unoccupied π* states (sharp peak A) and σ* states (peak B) while peak C can be an effect of plasmon contributions. 42,43 The onset of the B K edge is roughly identical for all defects, starting from 186.8 eV. A minute splitting of peak A was noticed at the faceted grain boundary structure.…”
Section: Resultsmentioning
confidence: 82%
“…In the depicted energy loss regime in Fig.5(e), the element-specific edges of B K ( peak A, B, C) and Mo M 4,5 (marked by the red arrow) are present. The energy-loss near-edge structure (ELNES) of the B K edge illustrates transitions from 1s to unoccupied π* states (sharp peak A) and σ* states ( peak B) while peak C can be an effect of plasmon contributions 42,43. The onset of the B K edge is roughly identical for all defects, starting from 186.8 eV.…”
mentioning
confidence: 98%
“…[36] In-situ sample treatments like ion bombardments have also been reported for TEM-EELS experiments. [37] For a recent detailed comparison between TEM and TXM we refer to a review as provided by Hitchcock et al [38] A combined X-ray and electron microscope design is the socalled X-ray photoemission electron microscopes (PEEM) [39][40][41] which uses a full field X-ray beam and the detection of the electrons emitted from the sample surface. Because X-PEEM uses electron detection, experiments under gas atmosphere are not possible.…”
Section: Electron Microscopes: Stem-eels Tem-eels and X-peemmentioning
confidence: 99%
“…This does not affect nano-crystallinity 15,16 , although micropores are observed. Amorphisation is possible using H + ion radiation, which alters the structure chemically 17 , but 1MeV electron impacts again do not affect the gross crystal structure 18 ; 2MeV impacts are required to induce amorphisation through impact.…”
Section: Introductionmentioning
confidence: 99%