2019
DOI: 10.1016/j.synthmet.2019.116144
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In-situ deposition of reduced graphene oxide layers on textile surfaces by the reactive inkjet printing technique and their use in supercapacitor applications

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Cited by 53 publications
(46 citation statements)
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“…The ratio of D to G peak intensities may depend on the preparation method of GO and is usually within 0.76–1.10. [ 20 ] In this study, the D peak is weaker than the G peak for all four GO‐enhanced textile fibers. Figure 2 shows the Raman spectra of GO‐polyamide composite fiber over the 200–4,000 cm −1 range.…”
Section: Results and Analysismentioning
confidence: 65%
“…The ratio of D to G peak intensities may depend on the preparation method of GO and is usually within 0.76–1.10. [ 20 ] In this study, the D peak is weaker than the G peak for all four GO‐enhanced textile fibers. Figure 2 shows the Raman spectra of GO‐polyamide composite fiber over the 200–4,000 cm −1 range.…”
Section: Results and Analysismentioning
confidence: 65%
“…This research provided a low cost, practical method for utilizing DIW for micro-and nanoscale devices. Additional studies have used DIW printing technologies for all-solid-state graphene-based in-plane MSCs, [175] highly transparent and flexible graphene MSCs, [176] rGO-coated textile fabrics as electrodes in supercapacitors, [177] and MSCs with interdigitated graphene patterns. [178] Ujjain et al used DIW to print a CNT electrode for supercapacitors.…”
Section: Carbon-based Materialsmentioning
confidence: 99%
“…A platinum-coated atomic force microscope tip has been used to induce the locally catalytic reduction of graphene oxide, enabling nanoribbons to be produced with widths of 20-80 nm [30]. Recently, an original method based on reactive inkjet printing was proposed for the production of reduced graphene oxide on textile substrate elements, which were then applied in a supercapacitor [31].…”
Section: Introductionmentioning
confidence: 99%
“…Summarizing the literature and issues discussed above, two conclusions can be made. First, a variety of methods and substrates can be used for graphene synthesis and to support the graphene layer: the chemical vapor deposition of graphene on various materials, such as metallic foil (Cu, Ni) [16,17], SiC [23], SiO 2 /Si [18,20,22], or on glass [19]; transferring CVD graphene onto SiO 2 /Si [21,24,25,52,54], PMMA [26], or on Si/SiN [27]; laser-induced chemical vapor deposition [34,35]; graphene ink coating on glass [57,58]; direct laser synthesis [37,38]; spin-coating a GO solution onto glass [41][42][43]45], polymer [48,49], or on sapphire [30]; and reactive inkjet printing of GO on textile surfaces [31]. Second, different types of lasers can be used for graphene patterning, including nano-, pico-, and femtosecond pulsed lasers generating beams with wavelengths from UV to IR.…”
Section: Introductionmentioning
confidence: 99%