2002
DOI: 10.4028/www.scientific.net/msf.404-407.535
|View full text |Cite
|
Sign up to set email alerts
|

In-Situ Analysis of Microstress and Texture Development during Tensile Deformation of MMCs at Room Temperature and at Elevated Temperatures Using Synchrotron Radiation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
1
0

Year Published

2004
2004
2006
2006

Publication Types

Select...
1
1

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(2 citation statements)
references
References 0 publications
0
1
0
Order By: Relevance
“…Characterization of the local stress and strain within bulk materials has been performed by numerous groups, using both energy-dispersive settings and monochromatic setups, e.g. [57,65,66,67,68,69,70,71,72,73,74].…”
Section: Hard X-ray Work Using Synchrotron Sourcesmentioning
confidence: 99%
“…Characterization of the local stress and strain within bulk materials has been performed by numerous groups, using both energy-dispersive settings and monochromatic setups, e.g. [57,65,66,67,68,69,70,71,72,73,74].…”
Section: Hard X-ray Work Using Synchrotron Sourcesmentioning
confidence: 99%
“…In this paper, the materials and the methods we used will be described. Then, we will present the indepth mechanical residual tensor which was calculated using dispersive energy method [1,5].…”
Section: Introductionmentioning
confidence: 99%