Improving the stability of atomic layer deposited alumina films in aqueous environments with metal oxide capping layers

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

“…Others have shown that even very thin coatings, a few nanometer TiO 2 or NiO, can remarkably stabilize alumina under water immersion. 40 ALD Al 2 O 3 is etched by deionized water with the etch rate of 0.2 nm/min. 41 Water is able to penetrate the lattice of the Al 2 O 3 film, and possibly react with hydroxyl groups, creating paths for moisture penetration.…”

Further development of surface metrology methods for predicting the functional performance of flexible photovoltaic barrier films

“…The ALD can also effectively coat the substrate with a highly conformal film, control the film thickness precisely, and tune the film composition flexibly [12]. However, ALD films can suffer from process-induced defects that inhibit their stability [13]. In this study, six representative Al 2 O 3 ALD samples processed by the Centre for Process Innovations (CPI), which are coded in pairs as (12k1001, 12k1002), (12k0901, 12k0902), (12K0803 and 12K0804), were assessed.…”

Synergy Between Plasma‐Assisted ALD and Roll‐to‐Roll Atmospheric Pressure PE‐CVD Processing of Moisture Barrier Films on Polymers

“…This consideration is supported also by the recently highlighted remarkable performance of hybrid inorganic layers comprised of an inorganic dyad or a nano-laminate -4 -heterogeneous structures serving as diffusion barriers. [3][4][5][6][7] Nevertheless, despite the excellent barrier film properties obtained using this approach, the above-mentioned experiments were carried out at low pressure and using relatively low deposition rate solutions.…”