2021
DOI: 10.1016/j.ceramint.2021.06.035
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Improving the photoelectrochemical performance of spin-coated WO3/BiVO4/ZnO photoanodes by maximizing charge transfer using an optimized ZnO decoration layer

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Cited by 18 publications
(8 citation statements)
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“…Additionally, BiFeO 3 was introduced into the WO 3 /BiVO 4 system resulting in high PEC performance and stability . To achieve an excellent PEC performance, sustained photoactivity, and effective passivation of sublayers, a ZnO layer introduced onto the WO 3 /BiVO 4 type-II heterojunction . However, coating TiO 2 layer played a crucial role in protecting BiVO 4 against photocorrosion and degradation .…”
Section: Introductionmentioning
confidence: 99%
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“…Additionally, BiFeO 3 was introduced into the WO 3 /BiVO 4 system resulting in high PEC performance and stability . To achieve an excellent PEC performance, sustained photoactivity, and effective passivation of sublayers, a ZnO layer introduced onto the WO 3 /BiVO 4 type-II heterojunction . However, coating TiO 2 layer played a crucial role in protecting BiVO 4 against photocorrosion and degradation .…”
Section: Introductionmentioning
confidence: 99%
“…22 Achieving potentially high PEC performance with longterm durability necessitates the post alteration of a WO 3 /BiVO 4 heterojunction with a surface protective agent. 23 Among these options, the construction of a passivation layer such as NiCo 2 O x , 24 Bi 2 S 3 , 25 CoP, 26 BiFeO 3 , 27 ZnO, 28 TiO 2 29 on top of a WO 3 /BiVO 4 heterojunction has demonstrated effective performance in enhancing stability. In a study conducted by Wei et al, 24 a robust catalyst known as NiCo 2 O x was applied to the surface of WO 3 /BiVO 4 photoanodes.…”
Section: Introductionmentioning
confidence: 99%
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“…The ZnO-WO 3 composites obtained in their research achieved a photocurrent of 0.353 mA/cm 2 at 0.3 V vs. Ag/AgCl in a 0.5 M Na 2 SO 4 solution. J. Ji et al [22] prepared WO 3 -BiVO 4 -ZnO using different steps. Tungstic acid and a polyvinyl alcohol solution were dissolved to produce a 0.12 M WO 3 precursor solution.…”
Section: Introductionmentioning
confidence: 99%