Improving the Optical Properties of SiNx:H Thin Film by Optimizing NH3:SiH4 Gas Ratio Using Plasma‐Enhanced Chemical Vapor Deposition
Alamgeer,
Hasnain Yousuf,
Muhammad Quddamah Khokhar
et al.
Abstract:In this article, we enhance the optical properties of hydrogenated silicon nitride (SiNx:H) thin film by optimization of deposition conditions using plasma‐enhanced chemical vapor deposition (PECVD). Specifically, the impact of varying NH3:SiH4 gas ratios (GRs) on the optical and structural properties of the SiNx:H film has been investigated. A ratio of 1.2 results in an optimal refractive index of 2.05, a thickness of 75.60 nm, and a deposition rate of 1.01 nm s−1, achieving the highest optical transmittance … Show more
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