Improving phase stability, hardness, and oxidation resistance of reactively magnetron sputtered (Al,Cr,Nb,Ta,Ti)N thin films by Si-alloying

Kretschmer, A.; Kirnbauer, A.; Moraes, V.; Primetzhofer, Daniel; Yalamanchili, Kumar; Rudigier, H.; Mayrhofer, P.H.

doi:10.1016/j.surfcoat.2021.127162

Cited by 37 publications

(10 citation statements)

References 56 publications

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“…However, these values are not very prominent compared with other related nitride films. The sputtering methods and parameters greatly influence the density, microstructure, and quality of thin films, which may result in different hardness and strength, such as the coating environments, target power, voltage bias, temperature of the substrate and different deposition mechanisms [ 35 , 36 , 37 , 38 , 39 , 40 ]. The existence of non-covalent bonds in our films positively contributes to the ductility but may reduce the hardness simultaneously.…”

Section: Resultsmentioning

confidence: 99%

Nanocrystalline (AlTiVCr)N Multi-Component Nitride Thin Films with Superior Mechanical Performance

Feng

Guan

et al. 2022

Nanomaterials

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Multi-component nitride thin films usually show high hardness and good wear resistance due to the nanoscale structure and solid-solution strengthening effect. However, the state of N atoms in the thin film and its effects on the compressive strength is still unclear. In this work, (AlTiVCr)N multi-component nitride thin films with a face-centered cubic (FCC) structure prepared by the direct current magnetron sputtering method exhibit a superior strength of ~4.5 GPa and final fracture at a strain of ~5.0%. The excellent mechanical properties are attributed to the synergistic effects of the nanocrystalline structure, covalent bonding between N and metal atoms, and interstitial strengthening. Our results could provide an intensive understanding of the relationship between microstructure and mechanical performances for multi-component nitride thin films, which may promote their applications in micro- and nano-devices.

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Section: Resultsmentioning

confidence: 99%

Nanocrystalline (AlTiVCr)N Multi-Component Nitride Thin Films with Superior Mechanical Performance

Feng

Guan

et al. 2022

Nanomaterials

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“…One of the main reasons for the improved oxidation resistance is attributed to the Nb-containing SiO 2 -rich layer, which reduces the number of vacancies and slows down the diffusion of oxygen atoms. Kretschmer et al [57] investigated the oxidation resistance of (AlCrNbTaTi)N and Si-doped (AlCrNbTaTi)N thin films prepared by the MS method on Si and sapphire substrates. The (AlCrNbTaTi)N film had an FCC structure, and decomposition of the FCC structure only occurred when the annealing temperature reached 1000 • C. Decomposition temperature shifted to 1200 • C when 12.0 at.% of Si was introduced to the HEA film composition, which means that Si-doping can further improve the oxidation resistance of HEA films.…”

Section: Thermal Stability and Oxidation Resistancementioning

confidence: 99%

Magnetron Sputtering High-Entropy Alloy Coatings: A Mini-Review

Padamata

Yasinskiy

Yanov

et al. 2022

Metals

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Surface coatings can enhance the substrate material’s properties and increase its lifetime. HEA-based materials have been extensively investigated as coating materials due to their superior hardness, excellent oxidation and corrosion resistance, effective diffusion barrier properties and wear resistance. Magnetron sputtering has been regarded as one of the most efficient methods for the deposition of HEA-based thin films. Metallic- and nitride-based HEA coatings can be easily deposited by introducing N2 gas along with the Ar in the reaction chamber. The parameters such as target composition, bias voltage, sputtering power and notably, gas flow ratio, influence the thin film’s morphology and mechanical properties.

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“…The good anti-oxidation performance of the films can be due to the protective α-Al 2 O 3 and α-SiO 2 layers. Kretschmer et al [17] studied also the oxidation behavior of (AlCrNbTaTi)N film in air as a function of Si concentration. The annealing was performed at 850 • C for 100 h. Without Si, the film showed an oxide thickness of 2700 nm, while those with Si had 280 nm (Figure 6).…”

Section: Oxidation At High Temperaturementioning

confidence: 99%

“…For example, TiAlN shows good oxidation resistance, but its resistance is well below than that of HEFs (AlCrNbSiYTi)N [16]. Kretschmer et al showed also the improved oxidation resistance of (AlCrNbTaTi)N at 850 • C for 100 h [17]. High-entropy nitrides and carbides form simple solid solutions exhibiting better mechanical properties due to the strong covalent bonds between the elements and the large strain mismatch.…”

Section: Introductionmentioning

confidence: 99%

“…HEFs are under extensive study due to their superior structural properties (multi-element solid solutions) and excellent mechanical and tribological performances. Various HEFs have been deposited by magnetron sputtering, revealing superior properties [17,[20][21][22][23] compared to the conventional coatings. Using the magnetron sputtering technique, a series of deposition parameters have been used to control the microstructure of HEFs.…”

Section: Introductionmentioning

confidence: 99%

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Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering

2022

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High-entropy films (HEFs) are of considerable interest in surface engineering applications due to their superior properties, such as good corrosion resistance, good thermal stability and excellent high temperature oxidation. Recently, the scientific community has seen an increasing development of the multicomponent coatings, improving their properties compared to conventional films. Technically, different strategies have been exploited to fabricate HEFs. Magnetron-sputtered HEFs have made significant advancements in this field. HEFs have various applications given their interesting performances. This article overviews the development and the outcome of HEFs prepared using the magnetron sputtering technique. The classification of HEFs is reported. The effect of magnetron sputtering parameters on the microstructural, mechanical, electrochemical and thermal properties of HEFs is also discussed. Applications of HEFs are reported in the last section.

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Improving phase stability, hardness, and oxidation resistance of reactively magnetron sputtered (Al,Cr,Nb,Ta,Ti)N thin films by Si-alloying

Cited by 37 publications

References 56 publications

Nanocrystalline (AlTiVCr)N Multi-Component Nitride Thin Films with Superior Mechanical Performance

Nanocrystalline (AlTiVCr)N Multi-Component Nitride Thin Films with Superior Mechanical Performance

Magnetron Sputtering High-Entropy Alloy Coatings: A Mini-Review

Recent Progress on High-Entropy Films Deposited by Magnetron Sputtering

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