Improvement of oxide chemical mechanical polishing performance by increasing Ce3+/Ce4+ ratio in ceria slurry via hydrogen reduction

Lee, Jaewon; Kim, Eungchul; Bae, Chulwoo; Seok, Hyunho; Cho, Jinil; Aydın, Kübra; Kim, Taesung

doi:10.1016/j.mssp.2023.107349

Cited by 16 publications

(6 citation statements)

References 44 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…They are also used as a doping materials in metal oxides to increase their photoctatlytic activity 3 , blended with various polymers to increase their gamma shielding capacity 4 . These materials are of strategic importance and find applications in solid oxide fuel cells 5 , nuclear security applications 6 , neutron absorbers 7 , laser crystals 8 , 9 , nuclear waste host materials 10 , chemical machine polishing 11 , 12 , light emitting devices 13 , rare earth magnets, control rods for fast breeder reactors 14 , radiation sheilding 10 , 15 , 16 , and catalysis 17 etc. REO nanoparticles are also used for biomedical and dental applications 18 – 20 .…”

Section: Introductionmentioning

confidence: 99%

Pressure driven polymorphic transitions in nanocrystalline Lu2O3, Tm2O3 and Eu2O3

Bura,

Bhoriya,

Yadav

et al. 2023

Sci Rep

View full text Add to dashboard Cite

The crystallite size of the materials considerably influences the material properties, including their compressibility and resistance to external forces and the stability of the crystalline structure; a corresponding study for which, so far, has been limited for the important class of nanocrystalline Rare Earth Sesquioxides (REOs). In the present study, we report the crystallographic structural transitions in nanocrystalline Rare Earth Oxides (REOs) under the influence of pressure, investigated via high-energy X-Ray Diffraction (XRD) measurements. The study has been carried out on three of the REOs, namely Lutetium oxide (Lu2O3), Thulium oxide (Tm2O3) and Europium oxide (Eu2O3) up to the pressures of 33, 22 and 11 GPa, respectively. The diffraction data of Lu2O3 and Tm2O3 suggests the occurrence of irreversible structural transitions from cubic to monoclinic phase, while Eu2O3 showed a transition from the cubic to hexagonal phase. The transitions were found to be accompanied by a collapse in the volume and the resulting Pressure–Volume (P–V) graphs are fitted with the 3rd order Birch-Murnaghan (BM) equation of state (EOS) to estimate the bulk moduli and their pressure derivatives. Our study establishes a qualitative relationship between the crystallite size and various material properties such as the lattice parameters, transition pressure, bulk modulus etc., and strengthens the knowledge regarding the behaviour of this technologically important class of materials.

show abstract

Section: Introductionmentioning

confidence: 99%

Pressure driven polymorphic transitions in nanocrystalline Lu2O3, Tm2O3 and Eu2O3

Bura,

Bhoriya,

Yadav

et al. 2023

Sci Rep

View full text Add to dashboard Cite

show abstract

“…Additionally, these results indicate that the Ce 3+ concentration of CNPs surfaces can influence their adhesion with the SiO 2 film surface. [55][56][57][58] Cleaning effects of GDW under megasonic conditions.-OM images presented in Figs. 8a-8d offer a qualitative analysis of residual CNPs after CMP and subsequent cleaning using degassed DIW, H 2 GDW, CO 2 GDW, and O 2 GDW.…”

Section: Resultsmentioning

confidence: 99%

Effects of Gas-Dissolved Water for Ceria Nanoparticles on the SiO₂ Film Surface in Post-CMP Cleaning

Park,

Jeon,

Liu

et al. 2024

ECS J. Solid State Sci. Technol.

Self Cite

View full text Add to dashboard Cite

As a trend of using colloidal and smaller ceria nanoparticles (CNPs) at the shallow trench isolation (STI) chemical mechanical polishing (CMP) in semiconductor manufacturing, post-CMP cleaning challenges in the removal of residual CNPs on the SiO2 film surface became much more challenging.We investigated the reduction/oxidation of ceria nanoparticles (CNPs) by hydrogen gas-dissolved water (H2 GDW), carbon dioxide gas-dissolved water (CO2 GDW), and oxygen gas-dissolved water (O2 GDW). The concentration of Ce3+ on the CNPs changed from 18.64% to 19.48%, 20.31% to 21.94%, and 21.27% to 19.22%, respectively, after immersion in H2 GDW, CO2 GDW, and O2 GDW for 3 to 12 h. Following the Ce3+ concentration of the CNP surface, adhesion energies between CNPs immersed in H2 GDW, CO2 GDW, and O2 GDW for 6 hours with SiO2 surface were 6.06E-16 J, 6.18E-16 J, and 4.83E-16 J. Cleaning experiments under megasonic conditions revealed the efficacy of H2 GDW and O2 GDW in removing residual CNPs from SiO2 surfaces. The residual cerium (Ce) ion concentrations remaining on the SiO2 film surface after cleaning, were 0.06, 0.41, and 0.10 ppb for H2 GDW, CO2 GDW, and O2 GDW, respectively.

show abstract

“…Indeed, experimental investigations revealed that the concentration of Ce(III) species in the ceria nanoparticles increased the polishing efficiency. The Ce 3+ /Ce 4+ ratio on the surfaces of nanoparticles can be increased by manipulating the synthesis and calcination steps, the chemical additives, and reducing with molecular hydrogen . Nevertheless, in our previous investigation, only nondefective ceria models were used, and, thus, the effects of Ce(III) species and oxygen vacancies on the ceria surfaces on the polishing efficiency were overlooked.…”

Section: Introductionmentioning

confidence: 99%

“…The Ce 3+ /Ce 4+ ratio on the surfaces of nanoparticles can be increased by manipulating the synthesis and calcination steps, 4 the chemical additives, 19 and reducing with molecular hydrogen. 20 Nevertheless, in our previous investigation, only nondefective ceria models were used, and, thus, the effects of Ce(III) species and oxygen vacancies on the ceria surfaces on the polishing efficiency were overlooked. In this work, we therefore intend to bridge this gap of knowledge and understand how defective surfaces can improve the CMP process of glass substrates.…”

Section: ■ Introductionmentioning

confidence: 99%

Impact of Atomic Defects on Ceria Surfaces on Chemical Mechanical Polishing of Silica Glass Surfaces

Di Biase,

Brugnoli,

Miyatani

et al. 2024

Langmuir

View full text Add to dashboard Cite

This study investigates the impact of atomic defects, such as oxygen vacancies and Ce 3+ ions, on cerium oxide (ceria) surfaces during chemical mechanical polishing (CMP) for silica glass finishing. Using density functional theory (DFT) and reactive molecular dynamics simulations, the interaction of orthosilicic molecules and silica glass with dry and wet ceria surfaces is explored. Defects alter the surface reactivity, leading to the dissociation of orthosilicic acid on oxygen vacancies, forming a strong Si−O−Ce bond. Hydroxylated surfaces exhibit easier oxygen vacancy formation and thermodynamically favored substitution of hydroxyl groups with orthosilicic acid. A new ReaxFF library for silica/ceria interfaces with defects is validated using DFT outcomes. Reactive MD simulations demonstrate that ceria surfaces with 30% Ce 3+ ions on (111) planes exhibit higher polishing efficiency, attributed to increased Si−O−Ce bond formation. The simultaneous presence of oxygen vacancies and various acidic and basic sites on ceria surfaces enhances the polishing efficiency, involving acid−base reactions with silica. Defective surfaces show superior efficiency by removing silicate chains, contrasting with nondefective surfaces removing isolated orthosilicate units. This study provides insights into optimizing CMP processes for high-precision glass industry surface finishing.

show abstract

Improvement of oxide chemical mechanical polishing performance by increasing Ce3+/Ce4+ ratio in ceria slurry via hydrogen reduction

Cited by 16 publications

References 44 publications

Pressure driven polymorphic transitions in nanocrystalline Lu2O3, Tm2O3 and Eu2O3

Pressure driven polymorphic transitions in nanocrystalline Lu2O3, Tm2O3 and Eu2O3

Effects of Gas-Dissolved Water for Ceria Nanoparticles on the SiO₂ Film Surface in Post-CMP Cleaning

Impact of Atomic Defects on Ceria Surfaces on Chemical Mechanical Polishing of Silica Glass Surfaces

Contact Info

Product

Resources

About

Improvement of oxide chemical mechanical polishing performance by increasing Ce3+/Ce4+ ratio in ceria slurry via hydrogen reduction

Cited by 16 publications

References 44 publications

Pressure driven polymorphic transitions in nanocrystalline Lu2O3, Tm2O3 and Eu2O3

Pressure driven polymorphic transitions in nanocrystalline Lu2O3, Tm2O3 and Eu2O3

Effects of Gas-Dissolved Water for Ceria Nanoparticles on the SiO2 Film Surface in Post-CMP Cleaning

Impact of Atomic Defects on Ceria Surfaces on Chemical Mechanical Polishing of Silica Glass Surfaces

Contact Info

Product

Resources

About

Effects of Gas-Dissolved Water for Ceria Nanoparticles on the SiO₂ Film Surface in Post-CMP Cleaning