2021
DOI: 10.1007/s11595-021-2441-7
|View full text |Cite
|
Sign up to set email alerts
|

Improvement of Ge MOS Electrical and Interfacial Characteristics by using NdAlON as Interfacial Passivation Layer

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2023
2023
2024
2024

Publication Types

Select...
2

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 22 publications
0
1
0
Order By: Relevance
“…When the BN content is 0.9%, the Dk, peel strength, oxygen index, and arc resistance of the prepared copper‐clad laminates are 19.52 GHz, 2.57 N/mm, 38%, and 160 KV, respectively. When the BN content increases, it initially enhances the properties of the copper‐clad laminate, leading to an increase in Dk value, peel strength, oxygen index, and arc resistance 28 . As the BN content further increases beyond a certain point (0.9%), it starts to have a negative impact, causing a decrease in these properties.…”
Section: Resultsmentioning
confidence: 99%
“…When the BN content is 0.9%, the Dk, peel strength, oxygen index, and arc resistance of the prepared copper‐clad laminates are 19.52 GHz, 2.57 N/mm, 38%, and 160 KV, respectively. When the BN content increases, it initially enhances the properties of the copper‐clad laminate, leading to an increase in Dk value, peel strength, oxygen index, and arc resistance 28 . As the BN content further increases beyond a certain point (0.9%), it starts to have a negative impact, causing a decrease in these properties.…”
Section: Resultsmentioning
confidence: 99%