Improvement of Friction and Wear Performance of Titanium Nitride Films by Chlorine Ion Implantation

Mitsuo, Atsushi; Aizawa, Tatsuhiko

doi:10.2320/matertrans1989.40.1361

Cited by 26 publications

(11 citation statements)

References 12 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Adding carbon to TiN by ion plating to form a TiCN film results in better wear performance. 4 Implantation of Cl C to chemically treat TiN films was carried out to improve the tribological properties: 5 the friction coefficient of the TiN film (¾2 µm thick) without Cl C implantation was ¾0.8, whereas it was <0.2 for the TiN film with Cl C implantation. 6 In order to clarify the effect of Cl C implantation on the friction coefficient, we analysed the surfaces of TiN films with/without Cl C implantation by scanning XPS.…”

Section: Introductionmentioning

confidence: 99%

Micro‐XPS analysis of slide‐tested TiN films with/without Cl⁺ implantation

Yoshitake

Thananan

Aizawaki

2002

Surface & Interface Analysis

View full text Add to dashboard Cite

Section: Introductionmentioning

confidence: 99%

Micro‐XPS analysis of slide‐tested TiN films with/without Cl⁺ implantation

Yoshitake

Thananan

Aizawaki

2002

Surface & Interface Analysis

View full text Add to dashboard Cite

“…As partially included in Table 1, the authors 6,11,[14][15][16][17] have proposed the importance of chemical surface modification to accommodate the self-protection and self-lubrication to coating films. In a similar manner to the conventional physical modification via the argon implantation, 8) significant amount of dislocations are induced with enhancement of implanted atom doses.…”

Section: Introductionmentioning

confidence: 99%

Chemical Modification of Titanium Nitride Films via Ion Implantation

2003

Self Cite

View full text Add to dashboard Cite

Titanium nitride, TiN is a typical ceramic coating film for cutting tools and dies; it often suffers from low oxidation temperature and high friction coefficient and wear volume. Its wearing and oxidation resistance is drastically improved by chemical modification via ion implantation. Carbon-, aluminum-and chlorine-ion implantation is introduced to describe the difference in the modified microstructure at the vicinity of surface. Ion-plated TiN films on a high-speed tool steel substrate are employed as a common specimen to be implanted. Each modified titanium nitride has its intrinsic, as-implanted nanostructure to the selected species. In the carbon implantation, the near-surface structure of TiN film is modified to have the layered bonding state with Ti-C/C-C/Ti-C. The Al-implantation modifies TiN to have non-equilibrium solid solution phase of (Ti, Al) N and metallic aluminum cluster. No change is seen in the chlorine implanted TiN except for increase of dislocations or point defects. The wear resistance is improved by the above as-implanted nano-structuring in the case of carbon implantation. Al-and Cl-implantation significantly improves the original oxidation and wearing resistance of TiN by the post-implantation nano-structuring. The stable, dense aluminum oxide layer is in-situ formed as a tight protective shield during the oxidation test by surface reaction between penetrating oxygen and diffusing aluminum. The lubricious titanium oxide film is also in-situ formed in the wear track at the presence of chlorine to sustain low friction and wear rate even in dry, severe wearing conditions.

show abstract

“…Moreover, TiN coating has a high friction coefficient under dry condition, and its corrosion resistance is not enough, either. [8][9][10] Consequently, development of novel coating material which provides high wear and corrosion resistance to Ti-6Al-4V has been intensely desired.…”

Section: Introductionmentioning

confidence: 99%

Formation of Diamond-Like Carbon Based Double-Layer Film on Ti-6Al-4V Substrate by Ionization Deposition

et al. 2004

View full text Add to dashboard Cite

A double-layer film, in which the top layer was a diamond-like carbon (DLC) film and the bottom layer was a compositionally graded film of silicon and carbon compounds with decreasing C/Si atomic ratio to a substrate, was successfully formed on a Ti-6Al-4V substrate by an ionization deposition method. In the film deposition process, a benzene vapor was used for the DLC deposition as a source gas, and hexamethyldisiloxane and benzene vapors were used as source gasses for the compositionally graded film of silicon and carbon compounds. The results of ball-on-disk and scratching tests showed that the double-layer film with graded composition provided a low friction coefficient, high wear resistance and good adhesion with the Ti-6Al-4V substrate compared to a single-layer DLC film. The DLC-based double-layer film developed in this study is much effective in wide applications of the Ti-6Al-4V alloy for which the use to antifriction components has been difficult.

show abstract

Improvement of Friction and Wear Performance of Titanium Nitride Films by Chlorine Ion Implantation

Cited by 26 publications

References 12 publications

Micro‐XPS analysis of slide‐tested TiN films with/without Cl⁺ implantation

Micro‐XPS analysis of slide‐tested TiN films with/without Cl⁺ implantation

Chemical Modification of Titanium Nitride Films via Ion Implantation

Formation of Diamond-Like Carbon Based Double-Layer Film on Ti-6Al-4V Substrate by Ionization Deposition

Contact Info

Product

Resources

About

Improvement of Friction and Wear Performance of Titanium Nitride Films by Chlorine Ion Implantation

Cited by 26 publications

References 12 publications

Micro‐XPS analysis of slide‐tested TiN films with/without Cl+ implantation

Micro‐XPS analysis of slide‐tested TiN films with/without Cl+ implantation

Chemical Modification of Titanium Nitride Films via Ion Implantation

Formation of Diamond-Like Carbon Based Double-Layer Film on Ti-6Al-4V Substrate by Ionization Deposition

Contact Info

Product

Resources

About

Micro‐XPS analysis of slide‐tested TiN films with/without Cl⁺ implantation

Micro‐XPS analysis of slide‐tested TiN films with/without Cl⁺ implantation