“…Four methods for fabricating pixelated CsI(Tl) have been reported, namely a laser cutting method [3], scintillator-filled pores in a silicon matrix [4][5][6] and scintillator filling in an SU-8 mold [7]. Recently, a new deposition method for fabricating pixelated CsI(Tl) was introduced, which used patterned SU-8 photo resist (PR) on a glass substrate [8].…”