Improvement of AME 8110 oxide etcher daily clean

Welp, K.; Fisher, P. H.; Holden, James R.; Wang, P.; Gunn, Mike; Franco, Jean

doi:10.1109/asmc.1998.731388

IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168)

DOI: 10.1109/asmc.1998.731388

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Improvement of AME 8110 oxide etcher daily clean

K. Welp

P. H. Fisher²,

James R. Holden³

et al.

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Improvement of AME 8110 oxide etcher daily clean

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