2013
DOI: 10.1109/led.2013.2259574
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Improvement in Photo-Bias Stability of High-Mobility Indium Zinc Oxide Thin-Film Transistors by Oxygen High-Pressure Annealing

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Cited by 54 publications
(22 citation statements)
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“…It can be postulated that an abundance of oxygen vacancy sites was intrinsically generated during film formation, and replaced by hydrogen species in form of H o − . The pristine a ‐IZO films with In‐rich composition consisted of various amounts of oxygen vacancies, most of which were occupied as deep trap states in the electronic structure of the a ‐IZO films . Facile generation of the oxygen vacancies in In‐rich oxide films has been typically reported in studies related to electrical and optical instability generated via negative bias illumination stress test, both in a ‐IZO and a ‐IGZO‐based TFTs .…”
Section: Resultsmentioning
confidence: 88%
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“…It can be postulated that an abundance of oxygen vacancy sites was intrinsically generated during film formation, and replaced by hydrogen species in form of H o − . The pristine a ‐IZO films with In‐rich composition consisted of various amounts of oxygen vacancies, most of which were occupied as deep trap states in the electronic structure of the a ‐IZO films . Facile generation of the oxygen vacancies in In‐rich oxide films has been typically reported in studies related to electrical and optical instability generated via negative bias illumination stress test, both in a ‐IZO and a ‐IGZO‐based TFTs .…”
Section: Resultsmentioning
confidence: 88%
“…The pristine a ‐IZO films with In‐rich composition consisted of various amounts of oxygen vacancies, most of which were occupied as deep trap states in the electronic structure of the a ‐IZO films . Facile generation of the oxygen vacancies in In‐rich oxide films has been typically reported in studies related to electrical and optical instability generated via negative bias illumination stress test, both in a ‐IZO and a ‐IGZO‐based TFTs . Especially, more than 99% of the oxygen vacancies in the a ‐IZO films generated deep‐level defects in the mid‐gap states, rather than shallow localized states beneath the conduction band minimum .…”
Section: Resultsmentioning
confidence: 93%
“…With progress in the information industry, thin‐film transistors (TFTs) and material technologies, which are core technologies of displays, have rapidly developed . Recent developments in the field of displays have satisfied the technical requirements of high resolution, high dynamic range, wide color gamut, and high frame rate owing to the performance improvements arising from the use of TFTs and materials such as plastic boards and indium tin oxide (ITO) .…”
Section: Introductionmentioning
confidence: 99%
“…With progress in the information industry, thin-film transistors (TFTs) and material technologies, which are core technologies of displays, have rapidly developed. [1][2][3][4] Recent developments in the field of displays have satisfied the technical requirements of high resolution, high dynamic range, wide color gamut, and high frame rate owing to the performance improvements arising from the use of TFTs and materials such as plastic boards and indium tin oxide (ITO). 5,6 In terms of visual design, curved displays, which are the precursors of flexible displays and have functionalities suitable for curved surfaces, have already been commercialized and are evolving into complete flexible displays.…”
Section: Introductionmentioning
confidence: 99%
“…The sensor can be integrated into display panels of hand-held consumer products for realizing photo-sensing functions such as ambient light sensors, image scanners, touch panel, etc 6–11 . Besides, amorphous metal oxide (AMO), especially the amorphous InZnO (a-IZO), has attracted much attention as the active layer material recently 12 . Unlike the conventional amorphous silicon (a-Si) TFT with poor carrier transport properties or the polycrystalline silicon (poly-Si) TFTs with poor uniformity over a large area, a-IZO shows a high electron mobility (~10 cm 2 /V.s), good uniformity, low manufacturing cost and low process temperature 13,14 .…”
Section: Introductionmentioning
confidence: 99%