Improvement and characterization of the electrochemical reactivity of amorphous carbon nitride electrodes

Benlahsen, M.; Cachet, H.; Charvet, S.; Debiemme‐Chouvy, Catherine; Deslouis, C.; Lagrini, A.; Vivier, Vincent

doi:10.1016/j.elecom.2005.03.003

Cited by 32 publications

(27 citation statements)

References 14 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Broad lines are the measurements; dash lines and thin solid lines are attributed to CÀP and PÀO bonds. In previous reports, where many physical or electrochemical methods including anodic, cathodic treatments and plasma treatment have been used to evolve the surface termination of BDD and active sites of a-C electrodes [29,30,10]. In our investigation, neither significantly structural differences nor remarkable variation in the sp 2 /sp 3 content for treated ta-C:P 10 electrodes are detected from Raman spectra.…”

Section: Effect Of Phosphorus Contentcontrasting

confidence: 53%

“…Evstefeeva [8] and Kiema [9] reported on the electrochemical reactivity of annealed carbon film electrodes. Brett [6] and Benlahsen [10] adopted perchloric acid and sulfuric acid pretreatments, respectively, to modulate the electrochemical behaviors by changing the surface activity of electrodes. Hadi evaluated the effect of anodization and laser on the voltammetric signals of pyrolytic carbon [11,12].…”

Section: Introductionmentioning

confidence: 99%

“…The treated samples were marked as ta-C:P 10 -0.2, ta-C:P 10 -0.5, ta-C:P 10 -2 and ta-C:P 10 . All solutions were prepared from analytical grade chemicals and deionized or twice-distilled water.…”

mentioning

confidence: 99%

See 2 more Smart Citations

Influence of Phosphorus Doping Level and Acid Pretreatment on the Voltammetric Behavior of Phosphorus Incorporated Tetrahedral Amorphous Carbon Film Electrodes

et al. 2007

View full text Add to dashboard Cite

Phosphorus incorporated tetrahedral amorphous carbon (ta-C:P) films are prepared by filtered cathodic vacuum arc technology with phosphine as the dopant. The influence of phosphorus doping level and acid pretreatment on the electrochemical properties of ta-C:P electrodes is investigated by cyclic voltammetry, Raman spectroscopy and X-ray photoemission spectroscopy. Results indicate that phosphorus incorporation improves the electrical and electrochemical behaviors of the films. A moderate phosphorus atomic fraction facilitates the interfacial electron transport in context of a high content of effective phosphorus impurities. Furthermore, acid pretreatment activates the surface of the films and gives an excellent reversible feature towards ferricyanide oxidation reaction by removing the inactive oxygenated sites and exposing the active conduction channels.

show abstract

Section: Effect Of Phosphorus Contentcontrasting

confidence: 53%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Influence of Phosphorus Doping Level and Acid Pretreatment on the Voltammetric Behavior of Phosphorus Incorporated Tetrahedral Amorphous Carbon Film Electrodes

et al. 2007

View full text Add to dashboard Cite

show abstract

“…The silicon wafers were mounted with InGa ohmic contact. All solutions were prepared from analytical grade chemicals (K 4 Fe(CN) 6 , K 3 Fe(CN) 6 , and KCl) purchased from Sigma and used as received in deionized and twice-distilled water. The electrolyte was quiescent and was maintained at 25°C.…”

Section: Methodsmentioning

confidence: 99%

Correlation between electrochemical reactivity and surface chemistry of amorphous carbon nitride films

Cachet

Debiemme‐Chouvy

Deslouis

et al. 2006

Surface & Interface Analysis

Self Cite

View full text Add to dashboard Cite

Amorphous carbon nitride (a-CN x ) films prepared by RF magnetron sputtering technique display a moderate electrochemical reactivity. However, after electrochemical activation by a cathodic pretreatment in acidic solution, they exhibit a quasimetallic behavior. This behavior has been notably assessed by scanning electrochemical microscopy (SECM). The approach curves show that the a-CN x electrode surfaces are made of active and inactive domains. These surfaces have also been characterized by atomic force microscopy (AFM) and XPS. AFM shows that the a-CN x surface roughness remains very low after the activation treatment. XPS analyses indicate that the electrochemical activation of the a-CN x materials is associated with a decrease in the number of superficial nitrogen atoms involved in sp 3 CN bonds.

show abstract

“…The scanning electrochemical microscope [40][41][42][43][44] has previously been used for various applications, such as surface modification [45][46][47] and reactivity, [48][49][50] biological applications, [51][52][53] determination of fast electrochemical rate constants, [54] corrosion studies, and others. [55][56][57][58][59] Bard et al investigated adsorption processes by using the surface-interrogation mode to sense the surface reactivity.…”

Section: Introductionmentioning

confidence: 99%

Alternating Current Measurements in Scanning Electrochemical Microscopy, Part 2: Detection of Adsorbates

et al. 2011

View full text Add to dashboard Cite

A scanning electrochemical microscope (SECM) in ac mode is used for the characterisation of the adsorption process during the hydrogen evolution reaction (HER) in sulfuric acid solution. It is shown that this technique allows quantitative analysis of the adsorption process, and measurements of the differential capacitance with the frequency as parameter are obtained. The time constant for relaxation of adsorbed hydrogen (H(ads)) is approximately 2 Hz, and analysis of the Nyquist plot allows direct evaluation of the charge involved. In addition, the direct comparison of the usual electrochemical impedance data and ac-SECM results obtained simultaneously permits characterisation of processes occurring at the surface and in solution.

show abstract

Improvement and characterization of the electrochemical reactivity of amorphous carbon nitride electrodes

Cited by 32 publications

References 14 publications

Influence of Phosphorus Doping Level and Acid Pretreatment on the Voltammetric Behavior of Phosphorus Incorporated Tetrahedral Amorphous Carbon Film Electrodes

Influence of Phosphorus Doping Level and Acid Pretreatment on the Voltammetric Behavior of Phosphorus Incorporated Tetrahedral Amorphous Carbon Film Electrodes

Correlation between electrochemical reactivity and surface chemistry of amorphous carbon nitride films

Alternating Current Measurements in Scanning Electrochemical Microscopy, Part 2: Detection of Adsorbates

Contact Info

Product

Resources

About