Improved Reflectance for Textured Mc-Silicon Solar Cells by SF₆/O₂ Plasma Etching

Abstract

On account of enhancing surface light trapping by reducing reflectance, front surface texturiing is always a key to improve the solar cells performance. As a maskless plasma texturing technique, reactive ion etching using SF 6 /O 2 plasma brings down reflectance distinctly by fluorine ions etching the surface of mc-silicon solar cells with the assisting of O 2 . The textured surface with bowl-like nanostructure exhibits fine anti-reflectance effect. Optimal reflectance of mc-silicon solar cells could be obtained by adjusting gases flow ratios, plasma power and etching time.