The direct nano-structuring of the surfaces of an optical element is nowadays a well-established technique used primarily to enhance the light transmission through that optical element. Typically periodic or quasiperiodic in nature, these anti-reflective surface structures (ARSS) can be designed to generate strong interference effects over large bandwidths [1,2], to work in various materials [3] and to exhibit additional characteristics such as high laser damage thresholds [4]. The period of the pattern should be on a subwavelength scale and the height of the individual features on the wavelength scale to avoid the undesired diffraction effects (as the period becomes close to the wavelength of interest) while providing the required phase change (or optical impedance matching between the air, in the typical case, and the optical element), respectively. Modeling of these structures is typically done using rigorous coupled-wave analysis RCWA methods although the effective-index method can also provide reasonable insight (it cannot however model through the diffraction edge region) [5]. We will present a review of our work on surface nanostructuring of many technologically important optical materials and components and illustrate record-low reflectivity losses, large bandwidth and record-high laser damage thresholds.Surface nanostructuring was performed through two principal methods. The first method, which yields a periodic anti-reflective surface structure (ARSS), requires the surface to be resist-patterned through UV lithography followed by dry-etching which transfers the resist pattern into the substrate surface. Fused silica windows, Nd:YAG and Ho:YAG crystals, along with spinel ceramic windows have been processed in this fashion. This work was performed using holography-based patterning followed by dry-etching [3]. The second method, which yields a random ARSS (rARSS), consisted in direct etching of the optical element surface using process parameters suited to the respective substrate material. This work was performed using an Advanced Silicon Etcher machine and based on published dry etching recipes [6]. Excellent results were obtained on fused silica windows, fibers and lenses, Nd:YAG and Ho:YAG ceramics, along with spinel ceramic windows. A third method, based on embossing was also developed for IR fiber end faces. Nickel and silicon stamps with periodically patterned structures were made using lithographic techniques and then pressed onto heated fiber end faces to leave an imprint of the structure on the fiber end face. SWS or straight walled structures were also fabricated.Figures 1 to 5 show specific data for flat silica windows. Other samples include silica lenses; silica optical fibers; infrared optical fibers; polycrystalline ceramic spinel; ceramic laser materials; single crystal laser materials; Sapphire and Germanium.