Improved performance of H-diamond MOSFETs with ZrO2/Al2O3 gate dielectric stacks deposited by electron beam method

Wang, Fei; Wang, Wei; Chen, GenQiang; Yang, PengHui; Wang, YanFeng; Zhang, MingHui; Wang, RuoZheng; Hu, WenBo; Wang, HongXing

doi:10.1016/j.diamond.2024.110905

Diamond and Related Materials

2024

DOI: 10.1016/j.diamond.2024.110905

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Improved performance of H-diamond MOSFETs with ZrO2/Al2O3 gate dielectric stacks deposited by electron beam method

Fei Wang,

Wei Wang,

GenQiang Chen

et al.

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Improved performance of H-diamond MOSFETs with ZrO2/Al2O3 gate dielectric stacks deposited by electron beam method

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