2016
DOI: 10.1007/s00339-016-9661-2
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Improved interface quality and luminescence capability of InGaN/GaN quantum wells with Mg pretreatment

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Cited by 6 publications
(2 citation statements)
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“…Our finding here is inline with the recent experimental studies focussing on this aspect. 55,60,61 Our calculations confirm and support the recent experimental arguments that understanding and tailoring the QW barrier interface in terms of roughness plays an impor-tant role for the electronic and optical properties of these systems. Furthermore, our argument that the interface roughness plays a key role for optical properties of these systems might also be related to the experimentally reported enhancement of the PL intensity of InGaN/GaN QWs after reduction of the surface roughness via Hydrogen treatment during growth.…”
Section: Comparison With Experiments and Consequencessupporting
confidence: 82%
“…Our finding here is inline with the recent experimental studies focussing on this aspect. 55,60,61 Our calculations confirm and support the recent experimental arguments that understanding and tailoring the QW barrier interface in terms of roughness plays an impor-tant role for the electronic and optical properties of these systems. Furthermore, our argument that the interface roughness plays a key role for optical properties of these systems might also be related to the experimentally reported enhancement of the PL intensity of InGaN/GaN QWs after reduction of the surface roughness via Hydrogen treatment during growth.…”
Section: Comparison With Experiments and Consequencessupporting
confidence: 82%
“…Recently, Liang et al [4] reported the room-temperature continuous-wave operation of 6.0 W GaN-based blue laser diode (LD) with an emission wavelength at around 442 nm. In GaN-based blue LDs, InGaN/GaN multi-quantum wells (MQWs) are widely used as active regions and their crystal quality will significantly affect the luminescence quality [5][6][7] and then the laser performance [8]. Scientists have made great efforts to grow InGaN/GaN materials with low defect density and high interface uniformity [9,10].…”
Section: Introductionmentioning
confidence: 99%