Abstract:Failure of the receding meniscus during immersion lithography is one of the well known problems. A thin liquid film left behind on the wafer during scanning may generate imaging defects. Liquid loss occurs at the receding meniscus when the smooth substrate is accelerated beyond a critical velocity of approximately 1 m/s. Nanotexturing the surface with average roughness values even below 10 nm results in critical velocity larger than 2.5 m/s, the upper limit of our apparatus. This unexpected increase in critica… Show more
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