2009
DOI: 10.1016/j.mseb.2008.10.050
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Improved homogeneity of microcrystalline absorber layer in thin-film silicon tandem solar cells

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Cited by 21 publications
(14 citation statements)
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References 15 publications
(22 reference statements)
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“…The increase in I c is visible for both the 1:200 series between r CO 2 0.5 to 1 and for the 1:500 series between r CO 2 of two and three even for layers of several hundreds of nanometers. Previous studies [22][23][24][25][26] have already shown the critical dependence of the film properties on the "substrate"-layer morphology especially in the transition region between a-Si:H and lc-Si:H growth. These studies show that layers deposited in the transition region grow completely amorphous or microcrystalline in dependence on the crystallinity of the "substrate" layer.…”
Section: Crystallinitymentioning
confidence: 99%
“…The increase in I c is visible for both the 1:200 series between r CO 2 0.5 to 1 and for the 1:500 series between r CO 2 of two and three even for layers of several hundreds of nanometers. Previous studies [22][23][24][25][26] have already shown the critical dependence of the film properties on the "substrate"-layer morphology especially in the transition region between a-Si:H and lc-Si:H growth. These studies show that layers deposited in the transition region grow completely amorphous or microcrystalline in dependence on the crystallinity of the "substrate" layer.…”
Section: Crystallinitymentioning
confidence: 99%
“…21 Samples were characterized either by a laser beam (k 5 532) directed on the as-produced sample, or, for selected samples, the Raman intensity ratio depth profile of the structure of the intrinsic absorber layer along the growth axis was determined by a gradient etching method (k 5 488 nm). 22,23 Here, Raman scattering measurements were carried out on slantwise etched craters through the solar cell structure. Solar cells were characterized by current-voltage (J-V) measurements at standard test conditions (AM 1.5 G, 100 mW/cm 2 , 25°C) illumination using a double source (Class A) AM 1.5 sun simulator.…”
Section: B Characterization Of Materials and Solar Cellsmentioning
confidence: 99%
“…In general, PECVD-inherent process drifts 19,21 and the conical evolution of the crystallites 1,9,22 for low Raman crystallinities impede a homogeneous absorber layer growth in the narrow deposition window close to 60%-70%. 21 To achieve these Raman crystallinities throughout the entire absorber layer process settings have to be adapted during the deposition of lc-Si:H. Since this requires an adequate monitoring of the Raman crystallinity, various in-situ and ex-situ measurement techniques have been applied to characterize the lc-Si:H absorber layer deposition.…”
Section: Introductionmentioning
confidence: 99%
“…21 To achieve these Raman crystallinities throughout the entire absorber layer process settings have to be adapted during the deposition of lc-Si:H. Since this requires an adequate monitoring of the Raman crystallinity, various in-situ and ex-situ measurement techniques have been applied to characterize the lc-Si:H absorber layer deposition. [8][9][10]12,13,19,[21][22][23][24][25][26][27][28] To monitor the layer growth with adequate accuracy, diagnostic methods with high depth and temporal resolution are required. For example, in-situ ellipsometry features high surface sensitivity.…”
Section: Introductionmentioning
confidence: 99%
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