Improved EM Performance by Adjusting Etching Profile of Top Metal for 28HK Metal Gate Process

Cao, Zherui; Zhao, Chunshan; Zhang, Wuzhi; Xu, Xiaolin; Cao, Yamin

doi:10.1109/cstic61820.2024.10531970

2024 Conference of Science and Technology for Integrated Circuits (CSTIC) 2024

DOI: 10.1109/cstic61820.2024.10531970

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Improved EM Performance by Adjusting Etching Profile of Top Metal for 28HK Metal Gate Process

Zherui Cao,

Chunshan Zhao,

Wuzhi Zhang

et al.

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Improved EM Performance by Adjusting Etching Profile of Top Metal for 28HK Metal Gate Process

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