2013
DOI: 10.1504/ijnt.2013.053524
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Improved electrical characteristics of porous germanium photodiode obtained by phosphorus ion implantation

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Cited by 3 publications
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“…These substrates have a reflectivity of about 33% for the wavelength range between 800 nm and 2000 nm [1,2]. Ion implantation is performed by the ion implanter installed in Microelectronics Institute of Barcelona in Spain.…”
Section: Np Germanium Junctions Characterizationmentioning
confidence: 99%
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“…These substrates have a reflectivity of about 33% for the wavelength range between 800 nm and 2000 nm [1,2]. Ion implantation is performed by the ion implanter installed in Microelectronics Institute of Barcelona in Spain.…”
Section: Np Germanium Junctions Characterizationmentioning
confidence: 99%
“…Ion implantation is performed by the ion implanter installed in Microelectronics Institute of Barcelona in Spain. It is performed with an ionizing beam energy of 150 keV for phosphorus impurity doses of 1 Â 10 À15 atm/ cm 2 [1,9,10]. The realized junctions have a junction depth of about 0.4 mm.…”
Section: Np Germanium Junctions Characterizationmentioning
confidence: 99%
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