Improved characteristics of <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" altimg="si1.svg"><mml:mrow><mml:mo stretchy="true">(</mml:mo><mml:mrow><mml:mn mathvariant="bold">11</mml:mn><mml:mover accent="true"><mml:mn mathvariant="bold">2</mml:mn><mml:mo>‾</mml:mo></mml:mover><mml:mn mathvariant="bold">2</mml:mn></mml:mrow><mml:mo stretchy="true">)</mml:mo></mml:mrow></mml:math> Al0.62Ga0.38N film grown with pulsed flow growth technique

Dai, Qian; Zhang, Xiong; Fang, Ruiting; Zhang, Lingling; Qi, Zhengqing; Chen, Peng; Chen, Lin; Wang, Shuchang

doi:10.1016/j.mssp.2024.108589

Materials Science in Semiconductor Processing

2024

DOI: 10.1016/j.mssp.2024.108589

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Improved characteristics of (112‾2) Al0.62Ga0.38N film grown with pulsed flow growth technique

Qian Dai,

Xiong Zhang,

Ruiting Fang

et al.

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Improved characteristics of (112‾2) Al0.62Ga0.38N film grown with pulsed flow growth technique

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