We present an approach for the highly sensitive photon detection based on the quantum dots (QDs) operating at temperature of 77K. The detection structure is based on an AlAs/GaAs/AlAs double barrier resonant tunneling diode combined with a layer of self-assembled InAs QDs (QD-RTD). A photon rate of 115 photons per second had induced 10nA photocurrent in this structure, corresponding to the photo-excited carrier multiplication factor of 10 7 . This high multiplication factor is achieved by the quantum dot induced memory effect and the resonant tunneling tuning effect of QD-RTD structure. * Electronic address: luwei@mail.sitp.ac.cn 1 There is currently great interest in exploring highly sensitive photon detection methodologies for potential use in remote sensing, spectroscopy, and even quantum information. [1] For the very high sensitivity, the photon detection will be in the photon counting mode, even in single photon counting mode. In order to approach the photon counting mode, very high photo-excited carrier multiplication factor is a basic requirement. Recently it has been demonstrated that structure of resonant tunneling diodes containing a layer of self-assembled quantum dots (QD-RTD) may be used as a very high photo-excited carrier multiplication device under the forward bias[2] at liquid helium temperature for single photon detection with the effective multiplication factor in the order of 10 8 .[3] This very high multiplication factor is caused by the storage effect of photo-excited hole in QD near RTD structure. This storage effect can also be achieved by the electrical bias, which presents a pronounced memory effect in current-voltage (I-V ) characteristics of QD-RTD device. [4,5] In this letter, we report that the memory phenomenon, induced by the electrical bias, can be used to enhance the photo-excited carrier multiplication factor in QD-RTD structure. The tunneling current passing through the QDs has been used in the multiplication process, so that the operating temperature has been increased from liquid helium (4.2K) in early report [3,6,7] to liquid nitrogen (77K) in present work.The samples in our experiment were grown by molecular beam epitaxy (MBE) on semiinsulated GaAs (100) substrate. The material layers, from top to bottom, were piled as: a 50nm highly n-doped GaAs (2 × 10 18 cm −3 ) as top contact layer, a 150nm i-GaAs absorber layer, a layer of self-assembled InAs quantum dots capped by 10nm GaAs, a 2nm GaAs spacer layer, a 11ML AlAs barrier, a 8nm GaAs quantum well, a 11ML AlAs barrier, a 20nm GaAs spacer layer, a 430nm graded n-doped GaAs as bottom contact layer (from 1 × 10 16 to 1 × 10 18 cm −3 ), a 15nm AlAs etch-stop layer, a 400nm GaAs buffer layer, and finally a semi-insulating GaAs (100) substrate. In order to investigate the density of QDs, another QD layer of same growing condition was deposited at the surface. The surface morphology was characterized by atomic force microscopy (AFM) as shown in Fig. 1
(a).The density of QDs is about 5.7 × 10 10 cm −2 , with the QDs' siz...