Abstract:Using radio-frequency (rf) sputtering technique tungsten oxide (WO3) thin films (∼150 nm) were deposited in a gas mixture of Ar and O2 at 10 mTorr pressure on indium tin oxide (ITO) and corning glass substrates. The films were annealed at 400 °C. Structural and optical properties of films were studied. Metal–insulator–metal (MIM) structure was made by depositing metal electrode (Ag, Al, Au) on the prepared WO3 thin films (on ITO substrate) using thermal evaporation technique. Electrical properties of the MIM s… Show more
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