Abstract:Highly c-axis orientated sputter deposited aluminium nitride (AlN) thin films are widely used as piezoelectric layers in micro-electro-mechanical systems (MEMS). Therefore, stable and reliable deposition and patterning of the AlN thin films in the fabrication process of such devices is of utmost importance. In this work, we study the wet chemical etching behavior of highly c-axis oriented AlN layers as well as the film-related residuals after the etching procedure. To investigate the impact of the underlying m… Show more
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