Impact of Organic Contaminants from the Environment on Electrical Characteristics of Thin Gate Oxides

Abstract

PACS. 81.15.Hi -Molecular, atomic, ion, and chemical beam epitaxy. PACS. 68.65.-k -Low-dimensional, mesoscopic, and nanoscale systems: structure and nonelectronic properties. PACS. 78.67.Lt -Quantum wires.Abstract. -An original mechanism is described for the self-assembly of nanometer-sized structures in the silicon germanium material system. The self-organized formation of vertical Si-rich quantum wells (VSQW) is obtained during the growth of Si1−xGex on narrow line-shaped Si mesa, which are oriented in 150 on the Si (001) surface. The occurrence of the VSQW is accompanied by the formation of {15 3 23} facets on top of the mesa. Detailed structural insights have been gathered by cross-sectional transmission electron microscopy, secondary electron microscopy and photoluminescence measurements. Ge quantum wires are embedded into the VSQW forming a superlattice containing SiGe and Ge wires. Intense low-temperature photoluminescence, which can be assigned to this one-dimensional superlattice, has been observed.

VOC Outgassing from Baked and Unbaked Ventilation Filters

“…VOC outgassing from filters can also be a source of airborne molecular contaminants (AMC), which is a serious concern in clean room. It has been documented that organic contaminants adsorbed on a silicon wafer surface can cause various detrimental effects (Saga and Hattori, 1997;Ogata et al, 1998;Liu et al, 2002).…”

Investigations of semiconductor devices using SIMS; diffusion, contamination, process control

“…The cluster-ion or polyatomic analysis beam has been used in the imaging of bio tissues [8]. In the recent years, there has been explosive growth in the quantitative analysis of organic contaminants in the semiconductor process [9,10]. It is considered that SIMS has been wide spreading the powerful mass spectrometric and imaging technique into the various fields, such as semiconductor, organic, polymer, and bio, nevertheless, the portion of contributions in the semiconductor process development has partially been declined [11].…”

ToF‐SIMS analysis of organic impurities in UPW

“…1 Another source of organic contamination is ultrapure water (UPW) widely used in wet cleaning processes. 2 Organic impurities on wafer surface after rinsing in UPW at a final stage of wet cleaning have not been investigated because the surface of the wafer has been considered as a clean surface, and no analytical techniques have been developed for the investigation.…”