“…In a thick film regime, the volume of liquid above the ablation plume confines the plume expansion and prevents it from free expansion in the manner allowed by the less viscous medium of ambient air, thus the compressed, high pressure ablation plume attacks the surface of the sample to be machined causing a high etch rate due to the plume which more than compensates for the loss of laser etching due to inverse Bremstrahlung attenuation [23,24,25,12]. When using open thin film immersion, the same volume of liquid is not available to confine the ablation plume pressure, causing a threshold pressure exists in this condition; once exceeded, rupture occurs and plume gas escapes violently from the covering liquid film into the ambient air above, producing liquid splashing as a by-product [12]. The action of turbulence, instigated by the non-symmetrical drag profile, combined with the strong contribution of meniscus instability such as inertial, capillary and viscous effects, described schematically in Figure 1 …”