Impact of nitrogen reactive gas and substrate temperature on the optical, electrical and structural properties of sputtered TiN thin films

Transition metal nitride (TMN) thin films exhibit outstanding physical, chemical, and mechanical properties, making them best suitable for a wide variety of applications. The most commonly used technique to produce metal nitride thin films with specific properties at optimum conditions is magnetron sputtering. Considering this, this review begins with advancements in the sputtering process from basic diode sputtering to the most commonly used pulsed magnetron sputtering. Further, the literature on several TMNs deposited via magnetron sputtering is summarized, referring to several articles that have been published during the last decades. The main emphasis lies on nitride-based thin films' structural, morphological, and mechanical aspects for various applications. In addition, the influence of reactive gas flow rate, substrate temperature, layer thickness, postannealing temperature, substrate bias voltage, protective layers, the sputtering technique adopted, etc. on the quality and performance of the thin films is also focused. The overall review work can be beneficial for the students and researchers in understanding the basic sputtering phenomenon with its advancements, the relationship between deposition parameters and surface properties, and to know the current research trend for exploring several research gaps in the literature.

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“…Furthermore, the reflectance of the TiN thin films at various nitrogen flow rates is presented in Figure . [ 95 ]…”

Section: Surface Properties and Applications Of Tmnsmentioning

confidence: 99%

“…Reflectance of the TiN thin films at various nitrogen flow rates. [95] Figure 16. Effect of N 2 flow rate on a) hardness and Young's modulus b) wear rate of VN thin films deposited using RF magnetron sputtering at a power density of 6.23 W cm 2 .…”

Section: Surface Properties Of Vn Filmsmentioning

confidence: 99%

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Bharani

Sharma

2022

Physica Status Solidi (a)

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“…For example, even though Lu et al modified the TiN preferred orientation (Lu et al, 2020), they reported a poor crystallinity for the FCC-TiN when the nitrogen content was modified. Moreover, Mustapha and Fekkai reported that the substrate has a good impact on the crystalline structure of the TiN, but it affects the appearance of the Bragg's reflections (Mustapha and Fekkai, 2020).…”

Section: Ray Diffractionmentioning

confidence: 99%

“…Among these hard coatings, CNx and nitride-based compounds (TiNC, TiC and TiN), they are all broadly used due to their good hardness, they have a hardness between 15 to 40 GP, thermal conductivity between 25 to 260 W/mK and wear resistance, modulus of elasticity between 180 to 370 GP, (Caicedo et al, 2006;Ipaz Caustumal and Zambrano, 2013). In this context, the titanium nitride (TiN) is a well-known compound since it is widely applied as a biocompatible material (Hussein et al, 2020), protective coating (Feng et al, 2017), electrodes (Mustapha and Fekkai, 2020) and diffusion barriers in microelectronics (Silva et al, 2020).…”

Section: Introductionmentioning

confidence: 99%

TiN hard coating as a candidate reference material for surface metrology in chemistry: characterization and quantification by bulk and surface analyses techniques

Juárez-García¹,

Hernández

Gutiérrez-Peralta

et al. 2022

revmetal

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This study presents the synthesis and characterization of TiN hard coatings as a candidate reference material for surface metrology in chemistry. TiN coatings were grown on a silicon wafer with (111) orientation using dc reactive magnetron sputtering. X-ray diffraction confirms that the diffraction phase of TiN coatings is polycrystalline, electron microscopy demonstrates that the TiN coatings presents pyramidal-shaped grains ranging from sub-micrometer to nano-size scale and with an average thickness of 666 nm. According to micro Raman results, the presence of LO phonon modes confirms that the TiN coatings are crystalline in nature and no impurities are detected. The mechanical properties at the nanoscale are evaluated using resonance tracking acoustic force atomic microscopy. The chemical composition of the TiN reveals a close 1:1 atomic ratio. The ANOVA is used to evaluate the homogeneity of the TiN via a homogeneity test according to the ISO Guide 35:2017, while, regarding the chemical composition of the Ti, the Fisher’s test demonstrates that the batch can be considered as homogeneous.

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“…However, controlled growth of TiN films with specified structural and chemical characteristics is still a difficult task. One of the methods of controlling the resulting films is to change the ratio of argon and nitrogen (Ar/N 2 ) concentrations [27][28]. This study investigates the effect of gas concentration on the properties of TiN thin films.…”

Section: Introductionmentioning

confidence: 99%

Effect of Nitrogen Concentration on Titanium Nitride Thin Film Formation

Yerlanuly

2023

ijmph

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This paper presents the study of the influence of argon/nitrogen gas concentration ratio in the of reactive magnetron sputtering process on the formation of titanium nitride (TiN) thin films. The addition of 5% nitrogen to the gas mixture is sufficient for the formation of titanium nitride films. It was found that changing the concentration of nitrogen in the reactive gas mixture affects the morphology of the surface, in particular, increasing the concentration of nitrogen leads to an increase in surface roughness of the resulting TiN films. According to the results of Raman spectroscopy, there is a dependence of the ratio of peak areas (TO + LO)/(TA + LA) observed in the regions of 603, 175 and 315 cm -1 , respectively, on the N 2 concentration. The X-ray Photoelectron Spectroscopy (XPS) analysis results show that increasing the nitrogen content in the reactive gas leads to a decrease in the oxygen concentration in the thin films. The results deepen the understanding of the synthesis of TiN thin films and their potential for the development and improvement of materials for various applications including microelectronics, optics, and coatings.

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Impact of nitrogen reactive gas and substrate temperature on the optical, electrical and structural properties of sputtered TiN thin films

Cited by 8 publications

References 24 publications

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

Magnetron Sputtered Thin Films Based on Transition Metal Nitride: Structure and Properties

TiN hard coating as a candidate reference material for surface metrology in chemistry: characterization and quantification by bulk and surface analyses techniques

Effect of Nitrogen Concentration on Titanium Nitride Thin Film Formation

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