Illumination pupilgram control using an intelligent illuminator

Hirayanagi, Noriyuki; Mizuno, Yasushi; Mori, Masakazu; Kita, Naonori; Matsui, Ryota; Matsuyama, Tomoyuki

doi:10.1117/12.2011077

Cited by 7 publications

(8 citation statements)

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“…The use of the controllable illumination pupil consisting of numerous point sources may become popular in conventional imaging systems such as microscopes; this approach has already been realized in advanced lithography systems [24][25][26][27][28]. We believe that our basic theory can be utilized to determine the basic specifications for the controllable illumination pupil from the viewpoint of spatial coherence.…”

Section: B Possible Application Of Our Approach For Determining Basimentioning

confidence: 96%

“…Let us assume that the illumination pupil consists of N point sources. In this regard, we remark that, to enhance the imaging properties in advanced micro-photolithography, the complex free-form illumination shape has been utilized recently [24][25][26][27][28]. The illumination pupil can comprise more than 10,000 deg of point sources.…”

Section: Intensity Matrix: Case Of N Point Sourcesmentioning

confidence: 96%

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Analytical solution for Gamo entropy under spatially partial coherent illumination

Yashiki¹

2015

J. Opt. Soc. Am. A

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We present a methodology for obtaining the analytical solution of the Gamo entropy, defined by the intensity matrix proposed by Gamo [J. Opt. Soc. Am.47, 976 (1957)JOSAAH0030-394110.1364/JOSA.47.000976]. The matrix, which consists of numerous image amplitudes at all the sampling points of the entire imaging plane, is generally infinite-dimensional. The essence of our theory is that the computational difficulties arising because of the infinite-dimensionality are avoided by introducing the inner products of two image amplitudes. The integral in continuous space plays the role of a buffer against the infinite-dimensionality. The validity of the approach is confirmed by comparing our analytical solution and Yamazoe's numerical simulations [J. Opt. Soc. Am. A28, 448 (2011)JOAOD60740-323210.1364/JOSAA.28.000448].

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Section: B Possible Application Of Our Approach For Determining Basimentioning

confidence: 96%

Section: Intensity Matrix: Case Of N Point Sourcesmentioning

confidence: 96%

Analytical solution for Gamo entropy under spatially partial coherent illumination

Yashiki¹

2015

J. Opt. Soc. Am. A

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“…The typical controllable parameters for this measurement include the illumination pupils, one-dimensional measurement patterns, and orientations of measurement patterns. To enhance the imaging quality of the latest ArF exposure apparatus, the illumination pupil consists of more than 10,000 deg of freedom, which are known as intelligent illuminator units by the Nikon Corporation [19][20][21][22][23]. Thus, the free-form shape of nonsymmetric illumination is available for this design.…”

Section: Measurement Of Full Wavefront Aberration a Simultaneous Linmentioning

confidence: 98%

“…From the definition given in Eqs. (21) and (74), the proof for the two inversions in Eqs. (25) and (26) are given, respectively, as…”

Section: Research Articlementioning

confidence: 99%

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Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

Yashiki¹

2015

Appl. Opt.

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The theory of full wavefront aberration measurements is developed using the intensity differences of aerial images, which are the projected images of one-dimensional measurement patterns consisting of single- or multibars. The key concept is the parity decomposition about the optical axis for two optical components: illumination pupil and wavefront aberration. An additional mathematical treatment, which is a perturbative approach with regard to aberration, is applied to the partially coherent imaging formula. The intensity difference of the two peaks has terms that are linear to the odd and even aberration with rigorously canceled squared aberration terms. The full wavefront aberration measurement is realized from simultaneous linear equations about the intensity difference. The validity of this approach is numerically confirmed under practical lithography conditions.

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Patterning challenges in the sub-10 nm era

Preil

2016

SPIE Proceedings

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Illumination pupilgram control using an intelligent illuminator

Cited by 7 publications

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Analytical solution for Gamo entropy under spatially partial coherent illumination

Analytical solution for Gamo entropy under spatially partial coherent illumination

Parity decomposition theory of full wavefront aberration measurement using the intensity differences of aerial images in microlithography

Patterning challenges in the sub-10 nm era

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