Illumination Field Uniformity Correction by Novel Finger Arrays for Lithography Illumination System
Shaoqin Luo,
Junbo Liu,
Chuan Jin
et al.
Abstract:In order to correct the integrated nonuniformity of a lithographic illumination field, a high-precision uniformity correction method for an advanced lithographic illumination system is proposed. The method adopts the opaque finger array structure and improves correction ability and accuracy by optimizing the arrangement and structure of the unit without changing the width of each unit. The correction accuracy is expressed as the percentage of the corrected integrated nonuniformity. Through theoretical analysis… Show more
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