2018
DOI: 10.1088/2058-6272/aac693
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Identification of the normal and abnormal glow discharge modes in a neon-xenon gas mixture at low pressure

Abstract: In this paper, we focused on the identification of the normal and abnormal glow discharge modes in a neon-xenon gas mixture at low pressure. We considered four gas mixtures: 90%Ne-10%Xe, 80%Ne-20%Xe, 70%Ne-30%Xe and 50%Ne-50%Xe at 1.5 Torr. The range of the gap voltage is 150-500 V. A one-dimensional fluid model with multiple species was used in this work, and the metastable state of the atoms as well as the radiation effects were integrated into the model too. The input data changed for each percentage in the… Show more

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Cited by 9 publications
(3 citation statements)
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“…The density of argon atoms n = 0.5 × 10 19 m -3 at the above pressure p = 0.02 Pa and room temperature [40][41][42]. Taking into account that the charge exchange cross-section of 5 keV argon ions amounts to σ c = 2 × 10 -19 m 2 [43] we may conclude that their charge exchange length λ c = 1/nσ c = 100 cm exceeds the grid sheath width d = 5-10 cm by an order of magnitude.…”
Section: Resultsmentioning
confidence: 99%
“…The density of argon atoms n = 0.5 × 10 19 m -3 at the above pressure p = 0.02 Pa and room temperature [40][41][42]. Taking into account that the charge exchange cross-section of 5 keV argon ions amounts to σ c = 2 × 10 -19 m 2 [43] we may conclude that their charge exchange length λ c = 1/nσ c = 100 cm exceeds the grid sheath width d = 5-10 cm by an order of magnitude.…”
Section: Resultsmentioning
confidence: 99%
“…Glow discharge plasma [1][2][3][4][5][6][7][8][9][10][11] produced by a powered DC or a RF source has various applications in industrial technologies and medical therapy. Among which, an improved discharge by the substance vapor deposition, a surface adaptation by different materials and the plasma etching.…”
Section: Introductionmentioning
confidence: 99%
“…The technology of the glow discharge [1][2][3][4][5][6][7] is an important domain in the microelectronic industry such as the etching or the deposition of thin solid films, and a spectroscopic analytical for metallic and sputtering treatments. This technology is carried out a lot in pure gas, and in mixture gases.…”
Section: Introductionmentioning
confidence: 99%