2005
DOI: 10.1016/j.susc.2005.09.012
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Identification of intermediate linear structure formed during Bi/Si(001) surface anneal

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Cited by 11 publications
(7 citation statements)
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“…Passivation was achieved using atomic hydrogen generated from a W filament heated to 1350 °C at a distance of 6 cm from the sample, whose temperature was held at 350 °C. While previous reports have suggested that the Bi nanowires are completely resistant to atomic H, , we found that at high doses of H the Bi nanowires begin to show increasing numbers of missing atom and missing dimer defects, and eventually most of the Bi atoms from the nanowires dewet and form small islands or clusters (see Supporting Information). Therefore, care was taken to control the atomic H dose such that the Bi nanowires remained largely intact, while sufficiently passivating the Si surface with a suitable concentration of dangling bond sites at which styrene chain growth can be initiated.…”
contrasting
confidence: 60%
“…Passivation was achieved using atomic hydrogen generated from a W filament heated to 1350 °C at a distance of 6 cm from the sample, whose temperature was held at 350 °C. While previous reports have suggested that the Bi nanowires are completely resistant to atomic H, , we found that at high doses of H the Bi nanowires begin to show increasing numbers of missing atom and missing dimer defects, and eventually most of the Bi atoms from the nanowires dewet and form small islands or clusters (see Supporting Information). Therefore, care was taken to control the atomic H dose such that the Bi nanowires remained largely intact, while sufficiently passivating the Si surface with a suitable concentration of dangling bond sites at which styrene chain growth can be initiated.…”
contrasting
confidence: 60%
“…Recently, there have been hot STM studies of GdSi 2 nanowire reactions on Si(100) which have helped to define the structure of a new type of nanowire [8]. Hot STM imaging has also been used to identify an intermediate, Bi-related, linear structure formed during Bi/Si(001) surface annealing [9]. STM of SrTiO 3 (001) has been carried out at temperatures of just under 800 • C and has been used to study the motion of step edges of the (2 × 2) surface reconstruction [10].…”
Section: Introductionmentioning
confidence: 99%
“…We note that there have been recent suggestions that the Bi nanolines have the structure known as the 'Miki' model (where the Bi dimers are in line with the underlying Si substrate dimers, and are separated by a missing surface dimer) [22]. As shown in recent papers [23,24], we believe that this assignment is contradicted by virtually all the evidence available; nevertheless, small islands of 'Miki' structure can remain in the substrate after preparation of a nanoline template [23], so we have modelled the effects of adding In to this structure. We find that it is at least 0.1 eV per pair of In atoms less stable than adding In to the Haiku structure.…”
mentioning
confidence: 53%